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Methods and apparatus for downstream dissociation of gases

A gas and downstream technology, applied in the direction of electrical components, circuits, discharge tubes, etc., can solve problems such as unsatisfactory processing parameters

Active Publication Date: 2009-06-17
MKS INSTR INC
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

Variations in chamber material composition can lead to undesired drift in process parameters and particle formation

Method used

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  • Methods and apparatus for downstream dissociation of gases
  • Methods and apparatus for downstream dissociation of gases
  • Methods and apparatus for downstream dissociation of gases

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[0064] figure 1 is a partial schematic diagram of a gas dissociation system 100 for generating dissociated gas in accordance with the present invention. Plasma is commonly used to activate a gas, placing the gas in an excited state, rendering the gas with increased reactivity. Exciting a gas involves raising the energy state of the gas. In some cases, the gas is excited to produce a dissociated gas containing ions, free radicals, atoms and molecules. The system 100 includes a plasma gas source 112 connected to the plasma chamber 108 by a gas line 116 . Valve 120 controls the plasma gas (e.g., O 2 , N 2 , Ar, NF 3 、H 2 and He) flows from the plasma gas source 112 through the gas line 116 into the plasma chamber 108 . Valve 120 may be, for example, a solenoid valve, a proportional solenoid valve, or a mass flow controller. Plasma generator 184 generates a region of plasma 132 in plasma chamber 108 . Plasma 132 includes plasma-activated gas 134 , a portion of which flow...

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Abstract

A method and apparatus for activating and dissociating gases involves generating an activated gas with a plasma located in a chamber. A downstream gas input is positioned relative to an output of the chamber to enable the activated gas to facilitate dissociation of a downstream gas introduced by the gas input, wherein the dissociated downstream gas does not substantially interact with an interior surface of the chamber.

Description

technical field [0001] The present invention relates to methods and apparatus for activating gases. In particular, the present invention relates to methods and apparatus for generating dissociated gases, and apparatus and methods for treating materials with dissociated gases Background technique [0002] Plasmas are often used to activate gases, placing the gas in an excited state to render the gas with increased reactivity. Excitation of a gas involves raising the energy state of the gas. In some cases, the gas is excited to produce a dissociated gas containing ions, free radicals, atoms and molecules. Dissociated gases are used in many industrial and scientific applications, including processing solid materials such as semiconductor wafers, powders, and other gases. Depending on the application, the parameters of the dissociated gas and the exposure of the dissociated gas to the material being processed vary widely. To produce gas dissociation, a considerable amount of...

Claims

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Application Information

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IPC IPC(8): H01J37/32
CPCH01J37/32449H01J37/32357H01J37/3244H01J37/32009H01J2237/327
Inventor J·J·苏斯W·M·霍尔伯J·T·苏莫森S·C·特鲁利张卫国陈星
Owner MKS INSTR INC
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