Supercharge Your Innovation With Domain-Expert AI Agents!

Method for inspecting layout

A technology of layout and graphics, applied in the field of electronic automation design, can solve the problems of high risk, chip failure, and no tools for detecting the identity and symmetry of the layout.

Active Publication Date: 2009-09-16
BRIGATES MICROELECTRONICS KUNSHAN
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, some transistors, capacitors, and resistors in the chip need to be consistent and matched, but due to differences in the shape of these transistors, capacitors, and resistors, or differences in the surrounding environment such as nearby wiring, the parameters of the transistors or It will affect the capacitance value of the capacitor and the resistance value of the resistor, and even cause the chip to fail
[0003] However, electronic design automation software, including layout editors and design rule verification tools, does not have tools to specifically detect the identity and symmetry of the layout, and can only meet the requirements for identity and symmetry in the design through the personal experience of designers. , and the risk of doing so is greater

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for inspecting layout
  • Method for inspecting layout
  • Method for inspecting layout

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0017] refer to figure 1 As shown, an embodiment of the method for checking the layout in the layout editor of the present invention may include the following steps:

[0018] Step s1, setting the layers to be compared as optional layers, and the layers not to be compared as non-selectable layers;

[0019] Step s2, extracting optional layer data in the first comparison area to form graphic data of the first comparison area;

[0020] Step s3, performing a first operation on the first comparison graphic corresponding to the first comparison area graphic data;

[0021] Step s4, moving the first comparison figure to the second comparison area;

[0022] Step s5, in the second comparison area, extract the graphic data of the second comparison graphic corresponding to the first comparison graphic;

[0023] Step s6, performing XOR operation on the first comparison graph and the second comparison graph to obtain the difference between the first comparison graph and the second compari...

example 1

[0031] figure 2 Shown is a partial graphic schematic diagram of a layout. refer to figure 2 As shown, it is assumed that the layout requirement for the cross pattern within the dotted frame range of the first comparison area and the cross pattern within the dotted line frame range of the second comparison area is to be identical, that is, the patterns are consistent. then if you want to figure 2 shown in the layout to be tested, combined with figure 1 The method steps shown can be performed as follows:

[0032] Since the purpose of this inspection layout is to compare whether the cross patterns in the first comparison area and the second comparison area are completely consistent, firstly, the figure 2 The layers corresponding to Figure 10 and Figure 11 in the figure are set as non-selectable layers, and the layers corresponding to Figure 20 and Figure 30 where the cross figure is located in the first comparison area are set as optional layers, and the second comparison...

example 2

[0046] The process of checking the layout in this example is similar to that described in Example 1, the difference is that the translation operation of the cross figure in the first comparison area can be performed in the following manner:

[0047] First, form a corresponding dotted-line frame diagram according to the extracted graphic data of the cross figure in the first comparison area, that is, form a dotted-line frame diagram 22 according to the graphic data corresponding to the graphic 20, and form a dotted-line frame diagram 32 according to the graphic data corresponding to the graphic 30.

[0048] Then, for the formed dotted line diagram, you can use the mouse to select and drag the dotted line diagram, or you can input approximate coordinates to perform a translation operation on the dotted line diagram.

[0049] After the panning operation, an automatic fit is performed on the dashed box plot. The automatic matching process is as follows:

[0050] Calculate the sim...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for inspecting layout. The method comprises the steps of setting a layer needing comparison as an optional layer, setting the layer without needing comparison as a non-optional layer, extracting the data of the optional layer in a first comparison region to form first comparison-region graphic data, executing first operation to a first comparison graph corresponding to the first comparison-region graphic data, moving the first comparison graph to a second comparison region, extracting graphic data of a second comparison graph corresponding to the first comparison graph in the second comparison region, executing XOR operation to the first comparison graph and the second comparison graph and obtaining the difference of the first comparison graph and the second comparison graph. The method for inspecting layout realizes the identity or symmetry inspection of the layout in a layout editor.

Description

technical field [0001] The invention relates to the field of electronic automation design, in particular to a method for checking layout in electronic automation design software. Background technique [0002] In the process of IC layout design, the identity and symmetry of the layout are very important. For example, some transistors, capacitors, and resistors in the chip need to be consistent and matched, but due to differences in the shape of these transistors, capacitors, and resistors, or differences in the surrounding environment such as nearby wiring, the parameters of the transistors or It will affect the capacitance value of the capacitor and the resistance value of the resistor, and even cause the chip to fail. [0003] However, electronic design automation software, including layout editors and design rule verification tools, does not have tools to specifically detect the identity and symmetry of the layout, and can only meet the requirements for identity and symme...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06F17/50
Inventor 罗文哲万涛涛
Owner BRIGATES MICROELECTRONICS KUNSHAN
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com