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Porous former with high adsorption performance and manufacturing method thereof

A technology of pore forming and adsorption body, which is applied in the field of high adsorption performance porous molding body and its manufacturing. It can solve the problems of high viscosity and difficulty in uniformly dispersing inorganic ion adsorption body, etc., and achieve the effect of high contact efficiency and high durability

Active Publication Date: 2009-11-18
ASAHI KASEI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present in this patented technology allows for efficient treatment of both liquid or gaseous materials with very small amounts (<10 ppm) of these contaminants without causing damage over time due to their presence on surfaces that come into direct physical contact with them. This results in improved performance compared to existing methods such as filtration processes.

Problems solved by technology

Technological Problem addressed in this patented technical paper relating to improving removal efficiency of various contaminants including nitrogen compounds, particularly uranyl trisulfate (UT), arthropod pesticides, tetrafluorescent materials used in lightings, heavy metals, and certain types of plasma display devices. Current methods involve adding chemical agents called chelators to neutralize acidic impurity elements, leading to increased costs associated with disposal processes. There exists a new technology where silicon dioxynaphthaite hydrogel particles could be developed without containing any residual carbons.

Method used

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  • Porous former with high adsorption performance and manufacturing method thereof
  • Porous former with high adsorption performance and manufacturing method thereof
  • Porous former with high adsorption performance and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0227] 375 g of polyvinylpyrrolidone (PVP, BASF Japan Co., Ltd., Luvitec K30 Powder (trade name)) was dissolved in 4125 g of dimethyl sulfoxide (DMSO, Kanto Chemical Co., Ltd.) to obtain a homogeneous solution. In 4500g of this solution, add 2250g of cerium oxide powder (Iwatani Industrial Co., Ltd.) with an average particle diameter of 30 μm, and use a A bead mill (SC100, Mitsui Mining Co., Ltd.) with zirconia balls was used to pulverize and mix for 30 minutes to obtain a yellow slurry. In addition, 375 g of ethylene-vinyl alcohol copolymer (EVOH, Nippon Synthetic Chemical Industry Co., Ltd., Soamol E3803 (trade name)) was added to the slurry, heated to 60° C. in a dissolution tank, and stirred and dissolved using a stirring blade. , to obtain a homogeneous slurry solution.

[0228] The obtained polymer slurry was heated to 40° C., and supplied to the inside of a cylindrical rotating container having a nozzle with a diameter of 5 mm on the side, and the container was rotate...

Embodiment 2

[0243] A spherical molded body having an average particle diameter of 600 μm was obtained by the same method as in Example 1 except that the pulverization and mixing treatment time was set to 5 minutes. The physical properties are listed in Table 1.

Embodiment 3

[0245] use diameter Except that the zirconia balls were pulverized and mixed, a spherical molded body with an average particle diameter of 600 μm was obtained by the same method as in Example 1. The physical properties are listed in Table 1.

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Abstract

The present invention provides a porous former with high adsorption performance and a manufacturing method thereof, the former is suitable for quickly absorbing and removing low-concentration phosphor, boron, fluorin, arsenic etc. contained in waste water, and absorbing adsorbent with high capacitance. The former contains organic macromolecule resin and inorganic iron absorption body, wherein ratio of 95% of relative cumulative X-ray intensity and 5% of relative cumulative X-ray intensity of component element loaded on the inorganic iron absorption body (ratio of relative cumulative X-ray intensity) is 1.0 to 10.0, the ratio of relative cumulative X-ray intensity is obtained with an electronic probe microanalyzer (EPMA).

Description

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Claims

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Application Information

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Owner ASAHI KASEI KK
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