Vacuum valve and closure plate for a vacuum valve
A vacuum valve, closing plate technology, applied in the direction of valve operation/release device, sliding valve, valve detail, etc., can solve the problem of long time related to loosening and tightening screws, and the connection is fully solved, etc.
Inactive Publication Date: 2012-10-10
VAT HLDG AG
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- Description
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- Application Information
AI Technical Summary
Problems solved by technology
[0012] A disadvantage of the known connection between the closure plate and the thrust rod is the relatively long time associated with unscrewing and tightening the screws during the detachment of the closure plate from the thrust rod and the mounting of the closure plate on said thrust rod
The above-mentioned tightening of the screws in two steps for the exact alignment of the closure plate creates a problem which cannot be adequately solved by the hitherto known connections
Method used
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Embodiment Construction
[0078] Figure 1 to Figure 6B Essentially one exemplary embodiment of the present invention is shown from different perspectives, different states, and different levels of detail, and thus the figures are in some cases described together. Figure 7 An alternative embodiment of the vacuum valve is shown in detail. Since the figures partially use common reference numerals and the embodiments differ only partially in details, reference numerals already specified are not discussed again in some cases.
[0079] figure 1 and figure 2 A vacuum valve 1 in the form of a rectangular gate for hermetically sealing the flow path indicated by arrow F is shown in oblique view and front view, respectively. Figure 3A , 3B and Figure 6A , 6B Indicates the closure plate 11 and its components, including figure 1 and figure 2 The end of the thrust rod 7 of the vacuum valve 1. These figures are described together below.
[0080] The vacuum valve 1 has a valve housing 2 with an opening...
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The invention relates to a vacuum valve for gas-tight sealing of a flow path, comprising at least one thrust rod, which has a cylindrical connecting section, and a closure plate which is removably mounted on the thrust rod and has at least one concave, semicircular first rod recess corresponding to the connecting section. A clamping piece, which has a concave, semicircular second rod recess corresponding to the connecting section, is adjustably mounted by means of a mechanical fixing element on the closure plate in such a way that the semicircular first rod recess and the opposite semicircular second rod recess define a cylindrical holding region which is adjustable in width and in which the cylindrical connecting section is detachably held. An empty chamber is formed in the first rod recess or the second rod recess and extends transversely with the axis of the thrust rod. In the empty chamber, an elastic pin extends transversely with the axis of the thrust rod and tangentially with the cylindrical connecting section. The elastic pin projects into the cylindrical connecting section thereby being clamped at the jointing part. The jointing part extends on the cylindrical connecting section thereby fixing the thrust rod along the axis of the thrust rod.
Description
technical field [0001] The invention relates to a vacuum valve for hermetically sealing a flow path according to the preamble of claim 1 and a closing plate according to the preamble of claim 12 , comprising a vacuum valve removably mounted on at least one Closure plate on thrust rod. Background technique [0002] Vacuum valves for substantially gas-tight sealing of a flow path leading to an opening formed in a valve housing are known from various embodiments in the prior art. Vacuum gate valves are used in particular in the field of IC and semiconductor manufacturing which has to be carried out in as protected an environment as possible in the absence of contaminating particles. For example, in a production plant of semiconductor wafers or liquid crystal substrates, highly sensitive semiconductor or liquid crystal elements pass sequentially through a plurality of processing chambers, in which the semiconductor elements present in the processing chambers are respectively pr...
Claims
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IPC IPC(8): F16K31/44
CPCF16K51/02F16K3/314
Inventor 伯恩哈德·杜里
Owner VAT HLDG AG