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Gas distributor comprising plurality of diffusion-welded panes and method for production of such gas distributor

A gas sparger, diffusion welding technology used in manufacturing tools, welding equipment, welding/welding/cutting items, etc.

Inactive Publication Date: 2014-03-12
AIXTRON AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Producing this type of gas distributor is painstaking because the small tubes have to be individually welded into previously made holes

Method used

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  • Gas distributor comprising plurality of diffusion-welded panes and method for production of such gas distributor
  • Gas distributor comprising plurality of diffusion-welded panes and method for production of such gas distributor
  • Gas distributor comprising plurality of diffusion-welded panes and method for production of such gas distributor

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Embodiment Construction

[0026] Exemplary embodiments relate to a gas distributor for a CVD reactor. The use of gas distributors of this type is described inter alia in EP 0687749A1. The gas distributor is part of the CVD reactor and is located vertically above the susceptor for holding the substrate to be coated. These substrates are located on the horizontal surface of the susceptor. Above the susceptor is a so-called process chamber into which process gases are guided from the underside 2' of the gas distributors 1,2. For this purpose, in figure 1 and 2The gas distributors 1 , 2 shown upside down in , have outlet openings 23 facing downwards, which are associated with the bottom 2 ′ of the gas distributors 1 , 2 and from which one process gas or a plurality of process gases different from each other can be discharged. . These process gases contain components that form the layer that will be deposited on the substrate. These process gases (processing gases) may contain aerosols that only ...

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Abstract

The invention relates to a gas distributor (1, 2) for a CVD reactor comprising two or more chambers (8, 9, 14), with supply lines ending therein, wherein at least one of the chambers (8, 9) forms a gas volume and is connected to gas outlet openings (23) associated with the bottom (2) of the gas distributor (1, 2) by means of a plurality of small tubes (11, 12, 13) crossing at least one other chamber (9, 14). For simplified production and technical enhancement, the gas distributor (1, 2), at least in the region of the small tubes (11, 12, 13), is made of a plurality of structured disks resting on top of each other, which are diffusion-welded to each other by pressure and temperature.

Description

technical field [0001] The invention relates to a gas distributor for a CVD reactor having two or more chambers, into each of which a feed line opens, at least one chamber delimiting a gas volume and intersecting at least one other chamber A plurality of small tubes are connected to gas outlet openings associated with the bottom of the gas distributor. [0002] The invention also relates to a method of producing a gas distributor of this type. Background technique [0003] EP 0687749B1, DE 69504762T2, US 5,871,586 and US 2006 / 0021574A1 disclose gas distributors of this type, also known as "shower head" distributors. They consist of plates arranged horizontally, one above the other. The plates are vertically spaced from each other, forming the bottom and the top of the chamber respectively. The perimeter of the cavity is formed by an annular perimeter part of steel. The downwardly facing bottom of the gas distributor has a plurality of gas outlet openings. The cavity abo...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23K20/02B23K20/227H01J37/32C23C16/455
CPCB23K20/227C23C16/45572B23K20/023H01J37/3244B23K2203/04C23C16/45565B23K2201/045B23K2201/18B23K2101/045B23K2101/18B23K2103/05
Inventor 维克托·塞维尔克里斯·亨贝弗雷德·克劳利
Owner AIXTRON AG