Method for producing polysilicon rod
A manufacturing method and technology of polysilicon rods, which are applied in the fields of solar energy and semiconductors, can solve the problems of high equipment and operation requirements, and achieve the effect of promoting mass transfer, promoting mass transfer, and not increasing maintenance costs
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[0106] Example 1:
[0107] In this embodiment, the reaction pressure in the reduction furnace is controlled at 0.3 MPa, and the reaction temperature is controlled at 1080°C.
[0108] At the beginning of the manufacturing method (at time 0), the hydrogen and trichlorosilane are respectively adjusted to 35.8Nm 3 / h and 5.5Nm 3 / h of air intake is continuously passed into the reduction furnace. At this time, the molar ratio Q value is 6.5.
[0109] First, it takes 45 hours to make the molar ratio Q expressed in the upper stage expression of the aforementioned first-order piecewise function (wherein the first-order piecewise function expression a value, b value, c value, and d value are passed in accordance with the aforementioned It is determined by calculation method, omitted here, the same below) continuously changed to 2.5. At the same time, within the aforementioned range, the inlet flow of hydrogen and trichlorosilane increased linearly and continuously to 100.8Nm with the increas...
Example Embodiment
[0127] Example 2:
[0128] In this embodiment, the reaction pressure in the reduction furnace is controlled at 0.3 MPa, and the reaction temperature is controlled at 1100°C.
[0129] At the beginning of the manufacturing method (at time 0), the hydrogen and trichlorosilane were adjusted to 36.6Nm 3 / h and 6.1Nm 3 / h of air intake is continuously passed into the reduction furnace. At this time, the molar ratio Q value is 6.
[0130] First, it takes 40 hours to make the molar ratio Q in the upper-stage expression of the aforementioned first-order piecewise function (wherein the first-order piecewise function expression a value, b value, c value, and d value are passed according to the aforementioned Determined by calculation method, omitted here, the same below) continuously changed to 3.0, at the same time, within the aforementioned range, the inlet flow rate of hydrogen and trichlorosilane increased linearly and continuously to 128.1Nm with the increase of deposition time. 3 / h and ...
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