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Valve device for tanks of processing solution

A technology for treating liquids and gates, which is applied in the direction of cells, electrolytic processes, electrolytic components, etc., and can solve problems such as reduced service life of gate components, maintenance of a sealed state, and difficulty

Inactive Publication Date: 2014-01-08
C UYEMURA & CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] In the gate device of Patent Document 3, the workpiece passage port is directly opened and closed by the bag-shaped gate member, and a part of the side surface of the bag-shaped gate member is protruded from the gap of the gate member support wall to close the workpiece passage port. Every time the gate device is opened and closed, the pocket-shaped gate part rubs against the inner surface of the above-mentioned gap, which reduces the life of the gate part
In addition, since the workpiece passing port is closed by the close contact of the bag-shaped shutter members, it is difficult to maintain a sealed state over the entire length of the workpiece passing port during long-term use.

Method used

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  • Valve device for tanks of processing solution
  • Valve device for tanks of processing solution
  • Valve device for tanks of processing solution

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0055] Figure 1 to Figure 16 An example of a liquid treatment tank including the shutter device according to the present invention is shown, and it is an example applied to a plating device.

[0056] (Outline of the overall coating equipment)

[0057] figure 1 It is a plan view of the whole electroplating apparatus, on a plating processing line configured as a substantially oblong (Japanese: oblong shape), from one end in the longitudinal direction of the processing line ( figure 1The loading part 10 of the right end of the) includes in the direction of arrow F (clockwise direction): the pretreatment tank (spray tank) 11 of the pretreatment process, the empty platform 12, the tank tank 13, and the plating tank 14 of the electroplating process , the tank tank 15 of the post-processing process, the empty platform 16, the first post-processing tank (spray tank) 17, the second post-processing tank (recovery tank) 18 at the other end in the longitudinal direction, the unloading ...

no. 2 approach

[0104] Figure 17 This is the second embodiment, and only the movable shutter member 93 is shown. In the movable shutter member 93, the integrally formed sliding portion 93a forms a cavity. That is, the sliding portion 93 a is drilled over substantially the entire length in the vertical direction, and the upper end opening of the processed hollow portion 140 is closed with the cover 141 . The lower end of the hollow portion 140 is closed by the lower end portion of the sliding portion 93a.

[0105] Thus, by making the sliding part 93a hollow, the weight of the movable shutter member 93 can be reduced, and the buoyancy can be efficiently utilized, thereby improving the smoothness of the opening and closing movement of the movable shutter member 93 . The smoothness and responsiveness of the opening and closing movement of the movable shutter member 93 can be improved, and the opening and closing movement can be quickly performed.

no. 3 approach

[0107] Figure 18 It is the third embodiment and shows a horizontal cross-sectional view of the shutter device 84 . The shutter device 84 of the present embodiment includes a guide case 113 instead of the guide plate 110 , and a movable shutter member 151 instead of the movable shutter member 93 . In addition, instead of the drive mechanism 94 described above, a drive mechanism 941 including a total of four pipe members including the first pipe members 101a, 101b and the second pipe members 102a, 102b is included. All of the components described above are disposed over substantially the entire length of the workpiece passing port 88 in the vertical direction. The other configurations are the same as those of the above-mentioned first embodiment, and the same reference numerals are assigned to the same or corresponding parts, and description thereof will be omitted. The guide housing 113 is formed in an L-shape viewed from above by a front guide part 113a and a left guide par...

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PUM

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Abstract

PURPOSE: A gate apparatus of a treatment liquid tank is provided to maintain high sealing performance and to simplify the driving mechanism. CONSTITUTION: A gate apparatus of a treatment liquid tank comprises a movable gate member(93) which opens and closes a workpiece passage(88) through which a flat workpiece passes, and a driving unit(94) which moves the movable gate member between the opening and closing positions. The driving unit comprises a slide part moving along with the movable gate member and a pair of tube members(101,102) which are arranged on both sides in the moving direction of the slide part and expansible.

Description

technical field [0001] The present invention relates to a gate device installed in a treatment liquid tank capable of storing a treatment liquid such as a plating liquid such as an electroplating device, and more particularly relates to a gate device capable of allowing a plate-shaped workpiece maintained in a vertical state by a workpiece conveying device to be carried in or out without lifting or lowering. The gate device of the processing liquid tank of the openable and closable workpiece passing port for carrying out the processing liquid tank. Background technique [0002] There are devices described in Patent Documents 1 and 2 as gate devices for allowing workpieces to pass through the processing liquid tank. These shutter devices include: a slit-shaped workpiece passage opening through which a plate-shaped workpiece can pass in a vertical posture; a slidable plate-shaped shutter plate member for opening and closing the workpiece passage opening; To move between, the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D17/00C25D21/00
CPCC25D17/00C25D21/11
Inventor 植村哲朗三好和也奈良田忠昭
Owner C UYEMURA & CO LTD