Synthetic method of Xyloketals compounds
A synthesis method and compound technology, applied in organic chemistry and other directions, can solve the problems of complex process and high production cost, and achieve the effect of simple process, low production cost and product purification.
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Embodiment 1
[0022] Embodiment 1: the synthesis of three substituted benzopyran ring ethers
[0023] In a 50ml round bottom flask, add 1.0g (7.94mmol) phloroglucinol and 2.2g (31.75mmol) butenone, 2.0g anhydrous magnesium sulfate, then add 30ml of anhydrous methanol, stir at 0°C to dissolve it, Then slowly add 2.56g (15.88mmol) of p-toluenesulfonic acid, continue to stir the reaction, let it slowly rise to room temperature, react for 8h, TLC after the reaction is completed, add saturated NH4Cl 10ml at 0°C to stop the reaction, add 100ml EtOAc, saturated NH 4 Cl (1×10ml), washed with saturated brine (2×10ml), anhydrous MgSO 4 It was dried and concentrated under reduced pressure. Column chromatography gave 2.85 g of white solid with a yield of 95%. mp 134-135°C; 1 H NMR (CDCl 3 , 400MHz) δ: 3.255(s, 3H), 3.242(s, 3H), 3.237(s, 3H), 2.641(m, 6H), 2.058(m, 3H), 1.746(m, 3H), 1.524(s , 6H), 1.518(s, 3H);
Embodiment 2
[0025] 1. Synthesis of disubstituted benzopyran cyclic ether (2)
[0026] In a 50ml round bottom flask, add 1.0g (7.94mmol) phloroglucinol and 1.3g (18.26mmol) butenone, 1.5g anhydrous magnesium sulfate, then add 30ml anhydrous methanol, stir at 0°C to dissolve it, Then slowly add 1.43g (7.94mmol) of p-toluenesulfonic acid, continue to stir the reaction, let it slowly rise to room temperature, react for 8h, TLC after the completion of the tracking reaction, add saturated NH at 0°C 4 Cl 10ml, stop the reaction, add 100ml EtOAc, saturated NH 4 Cl (1×10ml), washed with saturated brine (2×10ml), anhydrous MgSO 4 It was dried and concentrated under reduced pressure. Column chromatography gave 1.68 g of white solid with a yield of 72%. mp 170-171°C, 1 H NMR (CDCl 3 , 400MHz) δ: 5.977(s, 1H), 5.167(s, 1H), 3.270(s, 3H), 3.260(s, 3H), 2.649(m, 2H), 2.604(m, 2H), 2.101(m , 1H), 2.069(m, 1H), 1.792(m, 1H), 1.730(m, 1H), 1.542(s, 3H), 1.518(s, 3H);
[0027] 2. Protection of disubst...
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