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Projection objective with obscurated pupil for microlithography

A technology of projection objective lens and microlithography, applied in the field of projection objective lens, can solve the problem of insufficient guarantee of scattered light, etc., and achieve the effect of inhibiting transmission

Inactive Publication Date: 2014-01-29
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0020] For projection objectives with blocked pupils, the use of such scattered light shielding stops is not sufficient to ensure that scattered light does not flow directly into the image plane through through-holes in a single optical surface

Method used

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  • Projection objective with obscurated pupil for microlithography
  • Projection objective with obscurated pupil for microlithography
  • Projection objective with obscurated pupil for microlithography

Examples

Experimental program
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Embodiment Construction

[0048] figure 1 A projection objective for microlithography with a blocked pupil is shown, generally provided with the reference numeral 10 . The projection objective 10 has six optical surfaces S1 , S2 , S3 , S4 , S5 and S6 between the object plane O and the image plane B as seen in the direction of light propagation. The optical surfaces S1 to S6 are all mirrors, so that the projection objective 10 is a reflective projection objective.

[0049] The optical axis of projection objective 10 is indicated by OA.

[0050] Each of the optical surfaces S1 to S6 has an area provided for application of useful light, figure 1 The illustration in shows only the regions of the optical surfaces S1 to S6 provided for application of useful light.

[0051] figure 1 Also shown is the beam path of the useful light. The beam envelope SH of the useful light is shown, ie the beam cone formed by all the marginal rays of the useful light beam, here two marginal rays 13 and 15 are shown.

[00...

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Abstract

A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.

Description

technical field [0001] The invention relates to a projection objective with a blocked pupil for microlithography, the projection objective comprising a first optical surface with a first area provided for applying useful light and comprising a second area provided for applying useful light. At least one second optical surface of the region. During operation of the projection objective, the beam envelope of useful light extends between the first region and the second region. Background technique [0002] Such a projection objective for microlithography is known from document WO 2006 / 069725 A1. [0003] In microlithography, projection objectives are used in projection exposure equipment for the production of semiconductor components and other finely structured components. In this case, the projection objective is used to project the pattern of the photomask and optical reticle (often also called mask or reticle) with maximum resolution on a reduced scale onto the photosensit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B5/00G02B17/06
CPCG02B17/0657G03F7/70233G02B27/0018G02B5/005G02B5/003
Inventor 丹尼尔·克里默奥雷利安·多多克汉斯-于尔根·曼托拉尔夫·格鲁纳
Owner CARL ZEISS SMT GMBH