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Photosensitive graft polymer, and photosensitive resin composition comprising the same

A technology of grafted polymers and polymeric compounds, which is applied in the field of photosensitive resin compositions, can solve the problems that the dispersion stability of pigments cannot meet the needs, and achieve the effects of excellent transparency and excellent dispersion stability

Inactive Publication Date: 2010-09-01
SHOWA DENKO KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the dispersion stability of pigments using

Method used

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  • Photosensitive graft polymer, and photosensitive resin composition comprising the same
  • Photosensitive graft polymer, and photosensitive resin composition comprising the same
  • Photosensitive graft polymer, and photosensitive resin composition comprising the same

Examples

Experimental program
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Example Embodiment

Example

Hereinafter, examples and comparative examples are shown to specifically explain the present invention, but the present invention is not limited to these examples.

Example Embodiment

In a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and an introduction tube, 46.2 parts by mass of propylene glycol monomethyl ether acetate and tricyclo[5.2.1.02, 6] dec-8-yl methacrylate were added 11.1 parts by mass (approximately 0.050 mol) and 8.9 parts by mass (approximately 0.051 mol) of benzyl methacrylate were stirred and heated to 120°C while replacing with nitrogen. Next, 44.4 parts by mass (about 0.202 mol) of tricyclo[5.2.1.02,6]dec-8-yl methacrylate, 35.6 parts by mass (about 0.202 mol) of benzyl methacrylate, and 1.9 parts by mass of thioglycolic acid A solution of 6.0 parts by mass of tert-butyl peroxide (2-ethylhexanoic acid) was added dropwise to the flask from the dropping funnel over 2 hours, and then reacted at 120°C for 0.5 hours.

Next, the inside of the flask was replaced with air, and then 2.9 parts by mass of glycidyl methacrylate, 0.3 parts by mass of triphenylphosphine, and 0.06 parts by mass of methylhydroqui...

Example Embodiment

In a flask equipped with a stirring device, a dropping funnel, a condenser, a thermometer, and an introduction tube, 46.2 parts by mass of propylene glycol monomethyl ether acetate and tricyclo[5.2.1.02, 6] dec-8-yl methacrylate were added 18.4 parts by mass (approximately 0.084 mol) and 1.6 parts by mass (approximately 0.009 mol) of benzyl methacrylate were stirred and heated to 120°C while replacing with nitrogen. Next, 73.5 parts by mass (about 0.334 mol) of tricyclo[5.2.1.02,6]dec-8-yl methacrylate, 6.5 parts by mass (about 0.037 mol) of benzyl methacrylate, and 1.7 parts by mass of thioglycolic acid A solution of 6.0 parts by mass of tert-butyl peroxide (2-ethylhexanoic acid) was added dropwise to the flask from the dropping funnel over 2 hours, and then reacted at 120°C for 0.5 hours.

Next, the inside of the flask was replaced with air, and then 2.9 parts by mass of glycidyl methacrylate, 0.3 parts by mass of triphenylphosphine, and 0.06 parts by mass of methylhydroquino...

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Abstract

Disclosed is a photosensitive graft polymer characterized by having, as a branch polymer, a macromonomer (a) produced by copolymerizing 30 to 80 mol% of a polymerizable monomer having a C10-20 bridged cyclic hydrocarbon group (e.g., dicyclopentenyl (meth)acrylate) with 20 to 70 mol% of a polymerizable monomer having no bridged cyclic hydrocarbon group (e.g., benzyl (meth)acrylate). The polymerizable monomer having a C10-20 bridged cyclic hydrocarbon group is preferably at least one member selected from the group consisting of dicyclopentenyl (meth)acrylate, dicyclopentanyl (meth)acrylate, isobornyl methacrylate, adamantyl (meth)acrylate, and a compound represented by the formula (1) and a compound represented by the formula (2). (1) (2) wherein R1 represents a hydrogen or a methyl group.

Description

Technical field The present invention relates to a photosensitive graft polymer suitable for use in solder resists, various coatings, adhesives, adhesives for printing inks, adhesives for color filters, etc., and photosensitive resins containing the graft polymer combination. Background technique In recent years, from the viewpoint of saving resources and energy, active energy ray-curable resins that can be cured by active energy rays such as ultraviolet rays and electron beams have gradually been widely used in the fields of coatings and adhesives. In the field of electronic materials such as printed wiring boards, the use of active energy ray-curable resins as solder resists for semiconductor substrate resins has also begun to be applied. In addition, color filters used in color liquid crystal display devices and solid-state imaging elements are formed by forming colored coating films of red (R), green (G), and blue (B) in a predetermined pattern on a substrate, and The bla...

Claims

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Application Information

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IPC IPC(8): C08F8/14C08F290/04G03F7/004G03F7/033G03F7/038
CPCC08F290/046G03F7/027G03F7/0388
Inventor 木下健宏
Owner SHOWA DENKO KK
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