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High-performance glass polishing solution

A polishing liquid and high-performance technology, which is applied in the field of daily chemical industry, can solve the problems that the particle size and distribution of polishing powder and abrasive agent cannot be strictly controlled, and the performance of polishing powder is difficult to control stably, so as to achieve high flattening polishing efficiency and good dispersion stability Effect

Inactive Publication Date: 2016-07-20
王叶苗
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the high specific surface activation energy of micron and submicron agent solid particles, the agglomeration phenomenon makes winnowing unable to strictly control the particle size and distribution of polishing powder abrasives, making it difficult to stably control the performance of polishing powder in terms of scratching

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0007] Embodiment 1, a kind of high-performance glass polishing fluid, described each raw material is made up of following weight percent: 40% of rare earth oxide, polymer dispersant 0.5%, multifunctional accelerator 10%, potassium phosphate 1%, surfactant 10%.

Embodiment 2

[0008] Embodiment 2, a kind of high-performance glass polishing liquid, described each raw material is made up by weight percentage as follows: Rare earth oxide 1%, macromolecular dispersant 10%, multifunctional accelerator 0.1%, potassium phosphate 30%, surfactant 0.01%.

Embodiment 3

[0009] Embodiment 3, a kind of high-performance glass polishing fluid, described each raw material is made up of following weight percent: 20% of rare earth oxide, polymer dispersant 5%, multifunctional accelerator 6%, potassium phosphate 15%, surfactant 5%.

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PUM

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Abstract

The invention relates to the technical field of daily chemical engineering, and concretely relates to a high-performance glass polishing solution. The glass polishing solution comprises, by weight, 1-10% of rare earth oxide, 0.5-10% of a polymer dispersant, 0.1-10% of a multifunctional group accelerator, 1-30% of potassium phosphate and 0.01-10% of a surfactant. The purpose of the invention is to provide the high-performance glass polishing solution in order to solve problems existing in the prior art.

Description

technical field [0001] The invention relates to the technical field of daily chemical industry, in particular to a high-performance glass polishing liquid. Background technique [0002] At present, the glass polishing liquid used in the production of glass processing enterprises mainly uses large-particle rare earth oxide powder as polishing friction agent, the overall polishing rate is low, the dispersion stability is poor, it is easy to cause serious surface scratches, and there are also low flattening and polishing efficiency. defect. Long-time polishing often greatly reduces the polishing efficiency, resulting in rapid wear of the polishing machine, low production efficiency, and a large consumption of consumables. The particle size control of polishing powder is usually done by multi-stage winnowing. Due to the high specific surface activation energy of micron and submicron agent solid particles, the agglomeration phenomenon makes winnowing unable to strictly control ...

Claims

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Application Information

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IPC IPC(8): C09G1/02
Inventor 王叶苗
Owner 王叶苗
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