High-performance glass polishing solution

A polishing liquid and high-performance technology, which is applied in the field of daily chemical industry, can solve the problems that the particle size and distribution of polishing powder and abrasive agent cannot be strictly controlled, and the performance of polishing powder is difficult to control stably, so as to achieve high flattening polishing efficiency and good dispersion stability Effect

Inactive Publication Date: 2016-07-20
王叶苗
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the high specific surface activation energy of micron and submicron agent solid particles, the agglomeration phenomenon makes winnowing unable to strictly cont

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0007] Example 1, a high-performance glass polishing liquid. The raw materials are composed of the following weight percentages: 40% rare earth oxide, 0.5% polymer dispersant, 10% multifunctional accelerator, 1% potassium phosphate, and surfactant 10%.

Example Embodiment

[0008] Example 2, a high-performance glass polishing solution, the raw materials are composed of the following weight percentages: rare earth oxide 1%, polymer dispersant 10%, multifunctional accelerator 0.1%, potassium phosphate 30%, surfactant 0.01%.

Example Embodiment

[0009] Embodiment 3, a high-performance glass polishing liquid, the raw materials are composed of the following weight percentages: rare earth oxide 20%, polymer dispersant 5%, multifunctional accelerator 6%, potassium phosphate 15%, surfactant 5%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the technical field of daily chemical engineering, and concretely relates to a high-performance glass polishing solution. The glass polishing solution comprises, by weight, 1-10% of rare earth oxide, 0.5-10% of a polymer dispersant, 0.1-10% of a multifunctional group accelerator, 1-30% of potassium phosphate and 0.01-10% of a surfactant. The purpose of the invention is to provide the high-performance glass polishing solution in order to solve problems existing in the prior art.

Description

technical field [0001] The invention relates to the technical field of daily chemical industry, in particular to a high-performance glass polishing liquid. Background technique [0002] At present, the glass polishing liquid used in the production of glass processing enterprises mainly uses large-particle rare earth oxide powder as polishing friction agent, the overall polishing rate is low, the dispersion stability is poor, it is easy to cause serious surface scratches, and there are also low flattening and polishing efficiency. defect. Long-time polishing often greatly reduces the polishing efficiency, resulting in rapid wear of the polishing machine, low production efficiency, and a large consumption of consumables. The particle size control of polishing powder is usually done by multi-stage winnowing. Due to the high specific surface activation energy of micron and submicron agent solid particles, the agglomeration phenomenon makes winnowing unable to strictly control ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C09G1/02
Inventor 王叶苗
Owner 王叶苗
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products