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Method for profile analysis in image layout area

A contour analysis and area technology, applied in the direction of instruments, character and pattern recognition, computer parts, etc., can solve the problem of poor accuracy of layout area fitting, achieve the effect of convenient recording and processing, and improve accuracy

Inactive Publication Date: 2010-11-03
HANVON CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when there are irregularly shaped texts in the document image, inserted pictures, or the document image is tilted, the bounding rectangles of each area will overlap, resulting in poor accuracy of layout area fitting

Method used

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  • Method for profile analysis in image layout area
  • Method for profile analysis in image layout area
  • Method for profile analysis in image layout area

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Embodiment Construction

[0028] In order to understand the technical content of the present invention more clearly, the following examples are given in detail.

[0029] The present invention firstly provides an embodiment of a document image layout area contour analysis method, which is specifically analyzed as follows in conjunction with the accompanying drawings.

[0030] The image of the document to be processed is obtained by an image acquisition unit such as a scanning unit, and the document image is first binarized by the analysis unit, and then layout analysis is performed. There are many mature algorithms for binarization and layout analysis, which will not be described here. After the layout analysis, a series of layout areas are obtained, whose contours need to be analyzed with straight lines and polygons. Figure 2a Shown is the binary image of the document image in this embodiment, Figure 2b Shown is the analysis result of the document image layout in this embodiment. The layout is divid...

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Abstract

The invention provides a method for profile analysis in image layout area, belonging to the field of digital image processing technology and character recognition. The method comprises the following steps: 1), calculating minimum circumscribed rectangle in each layout area; 2), finding out the circumscribed rectangles in others area, wherein the circumscribed rectangles are intersected with the circumscribed rectangle in the existing area; recording a rectilinear polygon in the existing area formed by a peak of the circumscribed rectangle in existing area if the others areas does not exist; and if other areas exist, continuing the following steps; 3), carrying out classification mark for the pixel points in the circumscribed rectangle int the existing area; 4), segmenting the pixel points in the circumscribed rectangle of the existing area based on pixel points by classification mark; 5), obtaining rectilinear polygon profile in the existing area based on segmented pixel points in step 4); and 6), recording the peak of the rectilinear polygon profile to form the rectilinear polygon in the existing area.

Description

technical field [0001] The invention belongs to the technical field of digital image processing technology and text recognition (OCR, Optical Character Recognition), and in particular relates to an image layout area contour analysis method. Background technique [0002] The content in the document image can be divided into text (text), table (table), image (picture), graphics (graphics), separator (separator), etc., and the area composed of the same content is called homogeneous region (homogeneous region). ). Layout analysis is a method of segmenting and marking homogeneous regions in a document image, and it is the first step in document image analysis (DIA, Document Image Analysis) and OCR processing. [0003] After the layout analysis of the document image, a series of layout areas are obtained. For the convenience of subsequent processing, the smallest circumscribing rectangle of these areas is generally used to analyze its outline. This method of analysis is valid wh...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06K9/20G06K9/34
Inventor 刘正珍李永彬
Owner HANVON CORP
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