Semiconductor cleaning device and method for cleaning semiconductor apparatuses
A technology for cleaning devices and semiconductors, applied in liquid cleaning methods, chemical instruments and methods, cleaning methods and utensils, etc., can solve the problems of not being able to clean multiple semiconductor devices at the same time, and achieve the effect of removing contamination
Inactive Publication Date: 2010-11-17
SHANGHAI INTEGRATED CIRCUIT RES & DEV CENT
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Problems solved by technology
[0006] The technical problem solved by the present invention is: the existing supercritical carbon dioxide cleaning equipment and cleaning methods are basically monolithic, and cannot clean multiple semiconductor devices at the same time
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[0026] In order to make the protection scope of the utility model clearer and easier to understand, the technical solution of the utility model will be described below in combination with preferred embodiments of the utility model.
[0027] figure 1 It is a semiconductor cleaning device according to an embodiment of the present invention. refer to figure 1 As shown, the present invention provides a semiconductor cleaning device suitable for supercritical fluid, including: a process chamber 10, a liquid inlet pipeline 12 and a support 20 positioned in the process chamber 10, and multiple A nozzle 14 is provided with a drain pipe 22 at the bottom of the process chamber 10, and the drain pipe 22 can discharge the used supercritical fluid in time, wherein the drain pipe 22 is provided with a pressure regulator 24, The pressure regulator 24 can regulate the air pressure in the process chamber 10 , and the support 20 is provided with a plurality of device holding parts 16 , and th...
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The invention provides a semiconductor cleaning device and a method for cleaning semiconductor apparatuses. The pressure of a technical cavity can be well monitored and regulated by arranging a pressure regulator on a liquid drain pipe, a plurality of semiconductor apparatuses can be cleaned simultaneously by arranging a plurality of apparatus clamping parts on a support. The support and the apparatus clamping parts are movably connected. The semiconductor apparatuses to be cleaned can be cleaned while tilting. Supercritical fluid flows across the surfaces of the tilting semiconductor apparatuses under the action of gravity, and certain relative movement occurs between the supercritical fluid and the surfaces of the semiconductor apparatuses. Compared with the simply soaking, the invention removes contaminants on the surfaces of the semiconductor apparatuses more efficiently, and the purpose of cleaning a plurality of silicone chips at a time is realized.
Description
technical field [0001] The invention relates to the field of cleaning semiconductor devices, in particular to a semiconductor cleaning device and a method for cleaning semiconductor devices using the device. Background technique [0002] With the continuous improvement of the integrated circuit manufacturing process, the volume of semiconductor devices is becoming smaller and smaller, so the material loss caused by the cleaning process is becoming more and more important. In state-of-the-art processes, the permissible material loss per wash has reached a very, very small amount, which is a considerable challenge for the cleaning process. Among them, due to the high-dose ion implantation process, a dehydrogenated and amorphous carbon layer will be formed on the surface of the photoresist. Therefore, the stripping of the photoresist layer after high-dose ion implantation is a severe problem. test. [0003] At present, the deglue process is widely used in the industry. Firstl...
Claims
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IPC IPC(8): B08B3/02B08B3/08
Inventor 张晨骋
Owner SHANGHAI INTEGRATED CIRCUIT RES & DEV CENT