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Processing apparatus

A technology for processing devices and objects to be processed, applied in the direction of transportation and packaging, conveyor objects, instruments, etc., can solve the problems of unrecorded processing time changes, no parts consumption, etc., to suppress the decline in the operation rate of the device and suppress loss , the effect of extending the replacement cycle

Inactive Publication Date: 2013-07-24
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in Patent Document 1, there is no description that the timing of the processing executed in the same processing unit changes, and there is no focus on the problem of the consumption of the parts of the conveying mechanism.

Method used

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Examples

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Embodiment Construction

[0037] As an example of a processing device according to an embodiment of the present invention, refer to figure 1 , figure 2 A configuration example of a multi-chamber etching processing apparatus for performing an etching process as a vacuum process on a glass substrate for FPD (hereinafter referred to as a substrate) as a target object will be described. figure 1 It is a perspective view showing the external structure of the etching apparatus 1, figure 2 It is a cross-sectional plan view showing the internal structure of the etching apparatus 1 .

[0038] Such as figure 1 , figure 2 As shown, the etching apparatus 1 is provided with tray placement parts 2A, 2B, so that the trays C1, C2 accommodating a plurality of substrates S can be transported from the outside and placed on the tray placement parts 2A, 2B. on 2B. For example, an elevating mechanism 21 is provided on each of the bracket mounting portions 2A, 2B so that the brackets C1, C2 can be freely raised and l...

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Abstract

The invention provides a processing apparatus capable of restraining the part consumption of the transport mechanism and having the longer interval than previous apparatus. The processing component is processed by the processed body, the preceding stage component is used to load the processed body that can be carried in the processing component. The transport mechanism conveys the processed body between the processing component and the preceding stage component, upon generating a standby time that makes a series of movements of the transport mechanism suspend, the control part 61 outputs the control signal for reducing the transporting velocity of the transport mechanism.

Description

technical field [0001] The present invention relates to a processing device for performing etching treatment on a target object such as a glass substrate used in a flat panel display (hereinafter referred to as FPD (Flat Panel Display)), and particularly to a technique for transporting the target object in the processing device . Background technique [0002] A processing apparatus that performs etching or the like on a substrate as an object to be processed includes a transport mechanism for transporting the substrate within the apparatus, and the operating speed of the transport mechanism is set in advance. For example, the number of sheets to be processed by one device per hour (production rate) is determined, and then the operating speed of the transport mechanism is determined so as to satisfy this condition. [0003] However, in a processing device called a multi-chamber system in which a plurality of processing chambers for performing vacuum processing such as etchin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/677
CPCG05B19/42G05B2219/39527G05B2219/45031H01L21/67276H01L21/67742
Inventor 驹田秀树
Owner TOKYO ELECTRON LTD