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Color film substrate and manufacturing method thereof

A technology for a color filter substrate and a manufacturing method, applied in the field of liquid crystal displays and their manufacturing, can solve the problems of reducing the voltage retention time of pixel electrodes, affecting the display grayscale, and displaying image flickering, etc., so as to improve display performance, reduce light intensity, reduce The effect of dark current

Inactive Publication Date: 2011-03-30
BEIJING BOE OPTOELECTRONCIS TECH CO LTD
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  • Abstract
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AI Technical Summary

Problems solved by technology

The active layer in the channel region of the thin film transistor is a photosensitive material, which will generate a dark current when exposed to light, and the dark current will increase the off-state current of the thin film transistor, thereby reducing the holding time of the pixel electrode voltage, Not only affect the display grayscale, but also cause flickering defects in the displayed image

Method used

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  • Color film substrate and manufacturing method thereof
  • Color film substrate and manufacturing method thereof
  • Color film substrate and manufacturing method thereof

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Embodiment Construction

[0033] The technical solutions of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments.

[0034] figure 1 It is a structural schematic diagram of the color filter substrate of the present invention. Such as figure 1 As shown, the main structure of the color filter substrate of the present invention includes a substrate 10, a black matrix 20 and a transparent structural layer 70, wherein the black matrix 20 is formed on the substrate 10, the transparent structural layer 70 is formed on the black matrix 20, and the transparent structural layer 70 It is used to reduce the intensity of the reflected light intensity of the black matrix through the coherent interference of light. Such as figure 1 As shown, the first incident light A from outside 1 O on the surface of the transparent structural layer 70 1 Reflection and refraction occur at , forming the first reflected light B 1 and the second incident light...

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Abstract

The invention relates to a color film substrate and a manufacturing method thereof. The color film substrate comprises a black matrix prepared from a metal material, wherein a transparent structural layer for reducing the intensity of reflected light of the black matrix by coherent interference of light is formed on the black matrix, and the transparent structural layer is positioned above the black matrix. The manufacturing method of the color film substrate comprises the following steps: forming a pattern comprising the black matrix on a substrate; and forming the transparent structural layer for reducing the intensity of reflected light of the black matrix by the coherent interference of light, wherein the transparent structural layer is positioned above the black matrix. In the invention, the coherent interference of light is used, and the transparent structural layer for reducing the intensity of reflected light of the black matrix by the coherent interference of light is formed on the black matrix, thereby reducing the intensity of light injecting into a TFT channel region and irradiating an active layer, reducing dark current, and improving the display performance of TFT-LCD. The invention can be suitable for liquid crystal displays of a TN mode, a VA mode, an FFS mode, an IPS mode and the like, and has wide application prospect.

Description

technical field [0001] The invention relates to a liquid crystal display and a manufacturing method thereof, in particular to a color filter substrate and a manufacturing method thereof. Background technique [0002] A liquid crystal display (LCD for short) includes an array substrate and a color filter substrate in a box. The array substrate includes gate lines, data lines, pixel electrodes and thin film transistors. The gate lines and data lines perpendicular to each other define a pixel area. The thin film transistors and pixel electrodes are formed in the pixel area. The gate lines are used to provide the thin film transistors with on or off. The data line is used to provide the data signal to the pixel electrode, and the grayscale display is realized by controlling the deflection degree of the liquid crystal. The color filter substrate (also known as color filter, Color Filter) includes black matrix, color resin and common electrode. The color resin includes red, blue ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335G03F7/00
Inventor 刘翔谢振宇陈旭
Owner BEIJING BOE OPTOELECTRONCIS TECH CO LTD
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