Making method of flexible display assembly
A technology for flexible displays and manufacturing methods, applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., capable of solving problems such as poor surface flatness of metal flexible TFT substrates
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[0012] see Figure 2 to Figure 8 , which is a preferred embodiment of the manufacturing method of the flexible display component of the present invention. like figure 2 As shown, the present invention firstly provides a carrier substrate 200 defining a first surface 202 and an opposite second surface 204 . The carrier substrate 200 is a translucent substrate, which may include translucent materials such as glass, quartz or sapphire. Then, a sacrificial layer 210 is formed on the first surface 202 of the carrier substrate 200, and the thickness of the sacrificial layer 210 is less than 500 angstrom. In this preferred embodiment, the sacrificial layer 210 is formed on the first surface 202 through a chemical vapor deposition (CVD) process, and includes amorphous silicon material. It should be noted that in the CVD process, the hydrogen content of the sacrificial layer 210 can be increased by adding and adjusting silane (SiH4) and hydrogen. In addition, after the CVD process...
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