Preparation methods of gold and silver embedded target and film thereof

A technology of inlaying targets and gold and silver, which is applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of complex melting and casting process, uneven composition of coating samples, and low utilization rate of precious metals in target materials. Overcome the effects of unstable film composition, dense and uniform film structure, and reduced target cost
CN102051497BInactive Publication Date: 2012-11-14ZHENGZHOU UNIV
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Patents(China)
Current Assignee / Owner
ZHENGZHOU UNIV
Publication Date
2012-11-14
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The invention relates to preparation methods of a gold and silver embedded target and a film thereof. The gold and silver embedded target contains 10-30 percent of gold and 70-90 percent of silver. When the target is prepared, a pure silver target is used for carrying out magnetron sputtering to obtain a sputtering runway, a gold slot is opened, and then gold is embedded into the gold slot by adopting a press method; and when an alloy film is prepared, gold and silver on the runway of the gold and silver embedded target are sputtered under the condition of magnetron sputtering to be mixed anddeposited onto a substrate to form a gold and silver alloy film, wherein the magnetron sputtering is carried out under the conditions that the vacuum degree is 1*10<-3> to 5*10<-3>, the sputtering temperature is 20-40 DEG C, the sputtering rate is 20-200nm / minute, and the air pressure is 0.5-1Pa. In the gold and silver embedded target, gold is used for replacing partial silver on a silver target,and the gold and the silver are combined in an embedding mode, so that the utilization ratio of noble metals is high, the target cost is reduced; and the obtained target has the advantages of tight combination, high sputtering efficiency, stable property and good quality; and a prepared gold and silver alloy film has the advantages of stable property and components, higher visible light transmissivity and far infrared reflectivity than those of pure silver films, and better timeliness.
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Description

technical field

[0001] The invention relates to a magnetron sputtering coating target material and a film thereof, in particular to a preparation method of a gold-silver mosaic target material and a film thereof. Background technique

[0002] Magnetron sputtering coating is a new type of physical vapor coating method. Compared with the earlier evaporation coating method, it has obvious advantages in many aspects. As a relatively mature technology, magnetron sputtering has been applied in many fields.

[0003] The principle of magnetron sputtering: add an orthogonal magnetic field and an electric field between the sputtered target (cathode) and the anode, fill the high vacuum chamber with the required inert gas (usually Ar gas), and the permanent magnet on the target A magnetic field of 250-350 Gauss is formed on the surface of the material, which forms an orthogonal electromagnetic field with the high-voltage electric field. Under the action of the electric field, the Ar ga...

Claims

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