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Optical processing device in laser annealing equipment

A technology of optical processing and laser annealing, applied in optics, optical components, instruments, etc., can solve problems such as beam quality not meeting requirements

Inactive Publication Date: 2011-06-01
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] And because the light sources used in laser annealing equipment are generally excimer lasers or other high-power lasers, and the beam quality of this laser light source does not meet the requirements, generally cannot be directly used for laser annealing

Method used

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  • Optical processing device in laser annealing equipment
  • Optical processing device in laser annealing equipment
  • Optical processing device in laser annealing equipment

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Embodiment Construction

[0018] The object of the present invention is to propose an optical processing device for laser annealing equipment, wherein an adjustable link is added to the traditional optical system, so that the shape, area and energy density of the laser spot in the annealing equipment can be adjusted, expanding the laser For the applicable occasions of annealing equipment, only one equipment can effectively anneal materials of different shapes and areas, which not only reduces the cost and is easy to operate, but also helps to explore the annealing process.

[0019] refer to figure 1 According to one embodiment of the present invention, the optical processing device of the laser annealing equipment includes an ultraviolet laser light source 101 and a subsequent optical system for processing the laser beam emitted from the light source.

[0020] According to a specific embodiment of the present invention, the above-mentioned ultraviolet laser light source can be an excimer laser, or a Nd...

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Abstract

The invention relates to development of an optical processing device in laser annealing equipment, and the device can also be applied to other relevant fields. The optical processing device is characterized in that two replaceable assemblies and an iris diaphragm are combined, multiple sets of systems can be used for each assembly, and the first replaceable assembly and the iris diaphragm can be controlled together by a computer. By replacing the two assemblies and regulating a lens position in the first replaceable assembly and the iris diaphragm, users can autonomously select the shapes of faculae as a rectangle or square and carry out grading and continuous regulation on the sizes of the faculae in a larger range so that production efficiency is improved, and the stability and the usability of the whole system are also improved.

Description

technical field [0001] The invention belongs to an optical processing device in laser annealing equipment, and in particular relates to the design and specific implementation of the adjustment link in the optical processing device. Background technique [0002] In today's era of economic globalization and informatization, the IC industry is undoubtedly a strategic industry that affects the national economy, politics, and national defense security. At present, the world IC equipment industry has become the driving force and an important part of the IC industry. Over the past few decades, IC manufacturing has experienced rapid growth following Moore's Law. However, the scale reduction of integrated circuit manufacturing has also brought great difficulties and challenges in extremely small-scale process technology. [0003] In nanoscale CMOS devices, ultra-shallow and low-resistivity junctions play an increasingly important role in suppressing short-channel effects and obtain...

Claims

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Application Information

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IPC IPC(8): G02B27/09H01L21/324
Inventor 黄威尉昊赟李岩
Owner TSINGHUA UNIV
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