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Half-tone mask plate and manufacturing method thereof

The invention relates to a technology of a halftone mask and a manufacturing method, which are applied to the photoengraving process, optics, instruments and other directions of the pattern surface, which can solve the problems of inability to perform finer adjustment and manufacturing errors, and achieve the improvement of light transmittance, Improved uniformity and accuracy, improved transmittance

Active Publication Date: 2012-10-10
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The main method is to form a gap 8 in the halftone layer. It can be seen from the figure that although the slope of the photoresist side has been improved compared with before the improvement, the minimum width of the gap can only reach 0.8 μm when the gap is formed. , so finer adjustments cannot be made, and it is easy to cause manufacturing errors

Method used

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  • Half-tone mask plate and manufacturing method thereof
  • Half-tone mask plate and manufacturing method thereof
  • Half-tone mask plate and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] This embodiment provides a halftone mask. Figure 12 It is a schematic diagram of the structure of the halftone mask plate of the present invention. The half-tone mask plate includes a substrate 1, the substrate includes a semi-transmissive area, and at least one side of the semi-transmissive area is provided with a non-transmissive area adjacent to the semi-transmissive area, wherein the semi-transmissive area includes a The anti-transmission area at the edge, in this embodiment, a non-transmission area adjacent to the semi-transmission area is provided on both sides of the semi-transmission area, and the semi-transmission area includes the anti-transmission area located at both edges of the semi-transmission area; The area is provided with a first mask layer 2, and a second mask layer 3 is arranged on the first mask layer, and the second mask layer extends from the non-transmission area to the enhanced transmission area, and its extension part is separated from the su...

Embodiment 2

[0054] This embodiment provides a method for manufacturing a halftone mask. Such as image 3 Flowchart for making a halftone mask for this invention. A method for making a halftone mask comprises:

[0055] S10: forming a first mask layer on the surface of the substrate.

[0056] S20: forming a second mask layer on the surface of the first mask layer, wherein the etch rate of the material of the first mask layer is greater than the etch rate of the material of the second mask layer under the same etching conditions.

[0057] S30: selectively removing the first mask layer and the second mask layer of the semi-transmissive area, thereby forming a non-transmissive area covered by the first mask layer and the second mask layer and a semi-transmissive area exposing the substrate, And according to the difference in etch rate between the material of the first mask layer and the material of the second mask layer, the second mask layer extends from the non-transmission area to the en...

Embodiment 3

[0078] This embodiment provides a half-tone mask used for manufacturing a thin film transistor of a liquid crystal display.

[0079] A half-tone mask for manufacturing liquid crystal display thin film transistors, including a substrate, the substrate includes a non-transmissive area corresponding to the source electrode and drain electrode of the liquid crystal display thin film transistor, and a half tone corresponding to the channel of the liquid crystal display thin film transistor. In the transmission area, a non-transmission area is provided on at least one side of the semi-transmission area, wherein the semi-transmission area includes an anti-transmission area located at the edge of the semi-transmission area; a first mask layer is provided in the non-transmission area, and the A mask layer is provided with a second mask layer, and the second mask layer extends from the non-transmission area to the anti-transmission area; the part of the second mask layer extending to the...

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Abstract

The invention discloses a half-tone mask plate for manufacturing a liquid crystal display and a manufacturing method thereof, and aims to manufacture an ideal photoresist side slope when a channel of a panel thin film transistor of the liquid crystal display is manufactured. The half-tone mask plate comprises a substrate, wherein the substrate comprises a half-transmitting region; at least one side of the half-transmitting region is provided with a non-transmitting region which is adjacent to the half-transmitting region; the half-transmitting region comprises a transmission reinforcement region on the edge of the half-transmitting region; the non-transmitting region is provided with a first mask layer; the first mask layer is provided with a second mask layer; the second mask layer is extended to the transmission reinforcement region from the non-transmitting region; the part, which is extended to the transmission reinforcement region, of the second mask layer is separated from the substrate; the half-transmitting region is provided with a half-transmitting layer; and the half-transmitting layer is thinner than the first mask layer. The half-tone mask plate and the manufacturing method thereof can be used for manufacturing the liquid crystal display.

Description

technical field [0001] The invention relates to a mask plate, in particular to a halftone mask plate and a manufacturing method thereof. Background technique [0002] Liquid crystal displays are widely used in various daily necessities and office supplies, such as computers, mobile phones, and bulletin boards, due to their advantages of low energy consumption, low radiation, light weight, and thinness. [0003] A liquid crystal display includes an array substrate, a color filter substrate, and a liquid crystal layer injected between the two plates. The array substrate is usually produced through 4 to 6 rounds of mask (Mask) processes, including thin film deposition, mask exposure, development, etching and other processes. With the development of science and technology, the emergence of half-tone masks has reduced the manufacturing process of LCD panels to 4Mask process technology. [0004] For halftone masks, transmittance is a very important parameter. If the transmittan...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/32
Inventor 崔承镇金基用
Owner BOE TECH GRP CO LTD