Method and system for monitoring conservation time of photoresist

Abstract

The invention relates to a method and a system for monitoring the conservation time of photoresist. The method comprises the following steps of: identifying the type of the photoresist; determining theoretical conservation time limit corresponding to the identified type of the photoresist; measuring the temperature of a photoresist bottom of the photoresist; when the measured temperature of the photoresist bottle is above 0 DEG C, recording the using time of the photoresist bottle; and when the recorded using time of the photoresist bottle reaches or exceeds the theoretical conservation time limit, sending an alarm signal. The system comprises an identifying unit, a temperature measuring unit, a control unit, a storage unit and an alarm unit. According to the method and the system for monitoring the conservation time of the photoresist, mistakes and error which are caused by artificial monitoring can be reduced greatly, the time and energy of engineers or scientific research personnel also can be saved, and the method and the system can be used repeatedly for multiple times, so the cost is saved.

Description

technical field [0001] The present invention relates to preservation of photoresist, and in particular to a method and system for monitoring the preservation time of photoresist. Background technique [0002] Photoresists are widely used in processes such as the manufacture of printed circuits and integrated circuits, and in printing plate making. Photoresist, also known as photoresist, is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer and solvent. After the photosensitive resin is exposed to light, the photocuring reaction can quickly occur in the exposed area, so that the physical properties of the material, especially the solubility and affinity, will change significantly. Photoresist is mainly used to transfer the pattern on the photomask to the oxide layer on the surface of the wafer, and to protect the underlying material in subsequent processes. It can be seen that photoresist plays a very important role in the sem...

AI Technical Summary

Problems solved by technology

But this manual monitoring method is prone to errors and errors, and also wastes the time and energy of engineers or researchers

[0005] Therefore, how to find a simple method and system that can automatically monitor the storage time of photoresist, so as to avoid errors and errors during manual monitoring, and save human resources at the same time, is a problem that needs to be solved urgently.

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