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Light irradiation device

A light irradiation device and light irradiation technology are applied in the direction of exposure device, optics, and optomechanical equipment in photolithography, which can solve the problems of heavy weight of the device, high cost of making a mask holding mechanism, and difficulty in manufacturing, so as to reduce bending , Cheap production cost, reliable adsorption and retention mask effect

Active Publication Date: 2014-08-06
USHIO DENKI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

That is, the cost of manufacturing the mask holding mechanism is high, and the weight of the device on which it is mounted becomes heavy.
In addition, it is predicted that there will be an increase in the size of the mask due to the increase in the size of the liquid crystal substrate in the future, but the production of the mask holding mechanism itself is difficult at present

Method used

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  • Light irradiation device
  • Light irradiation device
  • Light irradiation device

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Embodiment Construction

[0060] use Figure 1 to Figure 10 One embodiment of the present invention will be described.

[0061] figure 1 It is a figure which shows the schematic structure of the light irradiation apparatus provided with the mask holding mechanism of this invention.

[0062] As shown in the figure, a plurality of rod-shaped lamps 2 that emit light including ultraviolet rays and reflectors 3 that reflect light emitted from the lamps 2 are provided inside the light irradiation unit 1 that emits light. The mask holding mechanism 4 is equipped with the figure 2A plurality of translucent rod-shaped members 41 described in detail, and a support frame 44 supporting the plurality of rod-shaped members 41 . The pipe 7 is connected to the connector 43 of the mask holding mechanism 4 . A vacuum pump 9 as a vacuum source and a compressed air supply source 10 as an air source are connected to the piping 7 via a switching valve 11 . The supply of vacuum and air to the pipe line 7 is performed b...

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PUM

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Abstract

The invention provides a light irradiation device having an inexpensive mask retaining mechanism which increases the weight of the device as little as possible. In the light irradiation device which is provided with a patterned mask (5) adsorbed and retained by a light-transmitting mask retaining mechanism (4) and makes the light from a light irradiation part (1) irradiate an article (W) to be irradiated through the mask (5), the mask retaining mechanism (4) comprises a light-transmitting rod-shaped component (41) with a larger length than the length of the mask (5) along the width direction and provided with a vacuum absorbing groove (42) or a vacuum absorbing hole on the lower surface for absorbing and retaining the mask (5), and a support frame (44) supporting the rod-shaped component (41) from the lower part. The rod-shaped component (41) is positioned by a positioning component which does not limit the upward movement of the rod-shaped component (41). The rod-shaped component (41) is supported by the support frame (44). Furthermore, the positioning component is installed in a way that the part for supporting the upward movement of the frame (44) is changeable.

Description

technical field [0001] The present invention relates to a light irradiation device, and in particular, to an exposure device used for pattern formation of semiconductors, printed circuit boards, liquid crystal substrates, etc., and a bonding device for bonding panels such as liquid crystal panels, etc. A photoirradiation device that irradiates light onto an object to be irradiated through a mask. Background technique [0002] In an exposure process for manufacturing semiconductors, printed circuit boards, liquid crystal substrates, etc., an exposure device that irradiates light including ultraviolet rays (exposure light) through a patterned mask to transfer a mask pattern to a workpiece is used. As such an exposure device, there is a proximity exposure device (proximity exposure) that brings a mask and a workpiece close to transfer a mask pattern onto a workpiece. Moreover, also in the bonding apparatus which bonds liquid crystal panels, bonding by the proximity exposure ap...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/2004G03F7/7055G03F7/70775H01L21/0275
Inventor 龟田洋幸
Owner USHIO DENKI KK