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Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor

A technology of radiation and composition, which is applied in the field of positive radiation-sensitive compositions, and can solve problems such as uneven coating and high flatness barriers of interlayer insulating films

Active Publication Date: 2014-07-16
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, in this series of steps, uneven coating may occur during coating, or unevenness in the formation of fine unevenness due to vacuum suction holes may occur on the coating film. Barriers to high planarity required by the nature of the interlayer insulating film

Method used

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  • Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor
  • Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor
  • Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor

Examples

Experimental program
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Effect test

Synthetic example 1

[0319] In a flask with a condenser tube and a stirrer, 7 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by mass of diethylene glycol ethyl methyl ether were added. Then, add 5 parts by mass of methacrylic acid, 40 parts by mass of 1-ethoxyethyl methacrylate, 5 parts by mass of styrene, 40 parts by mass of glycidyl methacrylate, 10 parts by mass of 2-methacrylic acid Hydroxyethyl ester and 3 parts by mass of α-methylstyrene dimer were replaced with nitrogen, and then slowly stirred. The temperature of the solution was raised to 70° C., and the temperature was maintained for 5 hours to obtain a polymer solution containing the polymer (A-1). The polystyrene-equivalent mass average molecular weight (Mw) of the polymer (A-1) was 9,000. In addition, the solid content concentration (the ratio of the mass of the polymer contained in the polymer solution to the total mass of the polymer solution; the same applies hereinafter) of the polymer solution obtained her...

Synthetic example 2

[0321] In a flask with a condenser tube and a stirrer, 7 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by mass of diethylene glycol ethyl methyl ether were added. Then, add 5 parts by mass of methacrylic acid, 40 parts by mass of tetrahydro-2H-pyran-2-yl methacrylate, 5 parts by mass of styrene, 40 parts by mass of glycidyl methacrylate, 10 parts by mass of methyl 2-hydroxyethyl acrylate and 3 parts by mass of α-methylstyrene dimer were replaced with nitrogen, and then slowly stirred. The temperature of the solution was raised to 70° C., and the temperature was maintained for 5 hours to obtain a polymer solution containing the polymer (A-2). The polystyrene-equivalent mass average molecular weight (Mw) of the polymer (A-2) was 9,000. In addition, the solid content concentration of the polymer solution obtained here was 31.3 mass %.

Synthetic example 3

[0323] In a flask with a condenser and a stirrer, 7 parts by mass of 2,2'-azobis(2-methylpropionate) and 200 parts by mass of propylene glycol monomethyl ether acetate were added. Next, 67 parts by mass of 1-n-butoxyethyl methacrylate, 23 parts by mass of benzyl methacrylate, and 10 parts by mass of methacrylic acid were added and replaced with nitrogen, followed by slow stirring. The temperature of the solution was raised to 80°C, and the temperature was maintained for 6 hours to obtain a polymer solution containing the polymer (a-1). The polystyrene-equivalent mass average molecular weight (Mw) of the polymer (a-1) was 9,000. In addition, the solid content concentration of the polymer solution obtained here was 30.3 mass %.

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Abstract

PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive composition for forming an interlayer insulating film having excellent heat resistance and transparency as well as high flatness without uneven application (film thickness uniformity) and applying at high speed, and having high radiation sensitivity.SOLUTION: The positive radiation-sensitive composition contains: [A] a polymer including a structural unit containing an acetal group or a ketal group in the same or different polymer molecules; [B] a photo-acid generating body; and [C] a copolymer including at least a structural unit deriving from (c1) a polymerizable compound expressed by formula (2), (c2) a polymerizable compound expressed by formula (3), and (c3) a polymerizable compound including a siloxane structure. In formula (2), Rrepresents a hydrogen atom or a methyl group, α is an integer of 0-6, and β is an integer of 1-20. In formula (3), Rrepresents a hydrogen atom or a methyl group, Rrepresents a 1-12C alkyl group, γ is 2 or 3, and (a) is the number of structural units, whose average is 1-30.

Description

technical field [0001] The present invention relates to a positive radiation-sensitive composition, an interlayer insulating film formed from the composition, and a method for forming the interlayer insulating film. The positive radiation-sensitive composition is suitable for forming liquid crystal display elements (LCD), organic Materials for interlayer insulating films of display devices such as EL display devices (OLEDs). Background technique [0002] In a display element, an interlayer insulating film is generally provided for the purpose of insulating interconnections arranged in layers. A positive type radiation-sensitive composition is widely used as a material for forming an interlayer insulating film because the number of steps required to obtain a required pattern shape is small and it is preferable to have sufficient flatness. The positive radiation-sensitive composition used for forming such an interlayer insulating film requires good radiation sensitivity and s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/075G03F7/004G03F7/00
CPCG02B1/04G03F7/00G03F7/004G03F7/039G03F7/075
Inventor 一户大吾
Owner JSR CORPORATIOON