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Method and apparatus for checking and controlling the removal of hydrogen fluoride from process gases

A process gas, hydrogen fluoride technology, applied in chemical instruments and methods, perfluorocarbon/hydrofluorocarbon capture, separation methods, etc., can solve the problem of not exceeding the emission limit, difficult to determine the hydrogen fluoride emission, etc. start effect

Active Publication Date: 2011-11-30
GENERAL ELECTRIC TECH GMBH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The problem encountered with the device of US 4,501,599 is that it is difficult to determine that the emission of hydrogen fluoride does not exceed the emission limit set by the government agency

Method used

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  • Method and apparatus for checking and controlling the removal of hydrogen fluoride from process gases
  • Method and apparatus for checking and controlling the removal of hydrogen fluoride from process gases
  • Method and apparatus for checking and controlling the removal of hydrogen fluoride from process gases

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Embodiment Construction

[0024] Description of the preferred embodiment

[0025] figure 1 is a schematic side view showing a gas purification system 1 constructed in accordance with a first embodiment of the present invention. The gas cleaning system 1 is designed to operate to remove gaseous pollutants and dust particles from process gases produced during an electrolytic reduction process for the production of aluminum from alumina. In this electrolytic reduction process, in order to maintain the clarity of the diagram in the figure, alumina is placed in the kettle ( figure 1 not shown in ) from which a process gas containing gaseous pollutants such as hydrogen fluoride and dust particles is produced. The resulting process gases are collected in a hood 2 . Pipe 4 is operatively connected to cover 2 to convey process gas, typically at a temperature of 60-200° C. or even higher, into horizontal distribution pipe 6 designed to operate to distribute process gas to the first A scrubber 8, a second scr...

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Abstract

A gas cleaning system (1) is designed for removing hydrogen fluoride from a process gas generated during the production of aluminium from alumina. The gas cleaning system (1) comprises a scrubbing chamber (8, 10, 12) for purposes of mixing the process gas with particulate alumina, and a filter device (24,26,28) which is located downstream of the scrubbing chamber (8,10,12) with respect to the direction of flow of the process gas. A sulphur dioxide measurement device (40, 42, 44, 50) is operative for measuring the amount of the concentration of sulphur dioxide that is present in the process gas downstream of the filter device (24, 26, 28). A controller (46) is operatively connected to the sulphur dioxide measurement device (40, 42, 44, 50) and is operative for utilizing the measured amount of the concentration of sulphur dioxide for purposes of evaluating the efficiency of the hydrogen fluoride removal by the gas cleaning system (1).

Description

field of invention [0001] The invention relates to a method for removing hydrogen fluoride from a process gas produced during the production of aluminum from alumina, wherein the method comprises the steps of mixing the process gas with particulate alumina in a scrubber, and Process gas comprising at least a portion of particulate alumina is conveyed from the scrubber chamber to a filter arrangement, wherein at least a portion of reaction products formed in the reaction between particulate alumina and hydrogen fluoride are removed from the process gas. [0002] The invention also relates to a gas cleaning system operable to remove hydrogen fluoride from process gases produced during the production of aluminum from alumina. Background of the invention [0003] During the production of aluminum, the electrolytic reduction process is often used to remove aluminum oxide (Al 2 o 3 ) to produce aluminum metal. The electrolytic reduction process produces a process gas containing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/10B01D53/30B01D53/68C25C3/22
CPCB01D53/30B01D2251/602B01D53/685B01D2257/2047C25C3/22Y02C20/30
Inventor G·维德O·E·布贾诺J·怀特
Owner GENERAL ELECTRIC TECH GMBH
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