Comparison management method for particle attached to mask plate

A management method and particle technology, which is applied to the photo-engraving process of the pattern surface, the original for photomechanical processing, optics, etc., which can solve the problem that the comparison method of reticle-attached particles cannot be precise and accurate, time-consuming, and labor-intensive. Cost and other issues, to achieve the effect of convenient operation, improve work efficiency, and save labor costs

Inactive Publication Date: 2012-01-11
SEMICON MFG INT (SHANGHAI) CORP
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  • Abstract
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  • Claims
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Problems solved by technology

[0003] The technical problem to be solved by the present invention is to provide a method for comparing and managing particles attached to reticles, so as to solve the problem that the comparison method of particles attached to reticles in the prior art cannot be precise and accurate and requires a lot of labor costs

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  • Comparison management method for particle attached to mask plate
  • Comparison management method for particle attached to mask plate

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Embodiment Construction

[0014] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0015] The comparison management method of particles attached to the reticle described in the present invention can be implemented in a variety of alternative ways. The following is an illustration through a preferred embodiment. Of course, the present invention is not limited to this specific embodiment. Ordinary people in the field Common substitutions known to the skilled person are undoubtedly within the protection scope of the present invention.

[0016] Secondly, the present invention is described in detail using schematic diagrams. When describing the embodiments of the present invention in detail, for the convenience of illustration, the schematic diagrams are not partially enlarged according to the general scale, which should n...

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Abstract

The invention provides a comparison management method for particles attached to a mask plate, which comprises the following steps: setting comparison standards for particles attached to mask plats at different levels according to the levels of the mask plates; delivering the mask plates into a scanning machine for scanning of the particles to obtain scanning results; and selecting the set comparison standards for the particles attached to the mask plates at the corresponding levels according to the levels of the mask plates; comparing the scanning results and the comparison standards, listing the mask plates complying with the standards into an array of mask plates to be distributed, and listing the mask plates non-conforming to the standards into an array of mask plates to be cleaned. By adopting the method, whether the particles on the mask plates at different levels exceeds the standards can be determined accurately, the labor and cost can be greatly saved, the operation can be facilitated, and the working efficiency can be increased.

Description

technical field [0001] The invention relates to the technical field of photolithography for semiconductor manufacturing, in particular to a comparison management method for particles attached to a mask plate. Background technique [0002] In the semiconductor manufacturing process, the photolithography process is one of the more complex processes. A reticle is an auxiliary device used to project complex circuit patterns onto a wafer surface through a photolithography process, so a reticle is a component associated with a machine or device used in a specific manufacturing process. Therefore, different reticles have to be assigned to different machines or devices depending on the fabrication process to be performed. Additionally, at a given moment, there may be several reticles that need to be assigned to a particular machine or device. For this reason, a computerized reticle management system is usually developed to optimize the deployment management of the reticle. In the...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00
Inventor 樊乡车永强郭伟凯
Owner SEMICON MFG INT (SHANGHAI) CORP
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