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Flow-through washing method and flow-through washing apparatus

A cleaning device and flow-through technology, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as retention and precipitation of cleaning liquids

Inactive Publication Date: 2012-04-18
RESONAC HOLDINGS CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, in the cleaning method of making the cleaning liquid flow from the bottom to the top of the cleaning tank, the pollutants such as dust peeled off from the surface of the substrate may not be discharged together with the cleaning liquid from the upper part of the cleaning tank, and a part of them may remain in the cleaning tank. stagnation, and sometimes precipitation of the cleaning solution in the cleaning tank

Method used

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  • Flow-through washing method and flow-through washing apparatus
  • Flow-through washing method and flow-through washing apparatus
  • Flow-through washing method and flow-through washing apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0065] In Example 1, as above image 3 As shown, the following experiment was carried out. In the case of complex flow (turbulent flow) in the cleaning tank 2 by applying ultrasonic vibration from the bottom surface side of the cleaning tank 2, the flow rate adjustment valves 4 and 6 were actually used to adjust the flow rate in the supply flow. The flow rate of the cleaning liquid L flowing through the port 3 and the discharge port 5 is such that the flow of the cleaning liquid L in the cleaning tank 2 is a laminar flow.

[0066]Specifically, use a cleaning tank 2 made of SUS304 with a length of 40 cm, a width of 40 cm, and a depth of 35 cm. On the side walls 2b and 2d of the cleaning tank 2, respectively, the supply port 3 and the discharge port 5 with a diameter of 15 mm are opposite. Arrange three rows at intervals of 55 mm in the height direction, arrange two rows at intervals of 60 mm in the height direction, and arrange nine rows alternately at intervals of 145 mm in th...

Embodiment 2

[0071] In Example 2, using the above figure 1 , 2 The shown flowing water cleaning apparatus 1 actually cleans the substrate W. As shown in FIG.

[0072] Specifically, use a cleaning tank 2 made of SUS304 with a length of 40 cm, a width of 40 cm, and a depth of 35 cm. On the side walls 2b and 2d of the cleaning tank 2, respectively, the supply port 3 and the discharge port 5 with a diameter of 15 mm are opposite. Seven rows are arranged at intervals of 5 cm in the width direction, and six rows are arranged at intervals of 5 cm in the height direction, a total of 42 (=7×6) are arranged in a grid, and the flow rate adjustment valves 4 and 6 are connected to each of them. In addition, an ultrasonic oscillator 7 with a frequency of 950 kHz and an output of 600 W is arranged outside the bottom surface of the cleaning tank 2 . In the filter 9, a 0.5-micron filter is used at the first stage, and the cleaning liquid L flowing in the cleaning tank 2 is cyclically reused.

[0073] In...

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Abstract

Disclosed are a flow-through washing method and a flow-through washing apparatus which efficiently remove dust sticking to the surface of a substrate and prevent dust from sticking to the surface of the substrate again after washing. The flow-through washing method runs washing liquid (L) inside a washing tank (2) in the lateral direction, and applies an ultrasonic vibration to the washing liquid (L) in a state in which an object (W) to be washed is immersed in this washing liquid (L), while washing this object (W). By regulating the flow rate of the washing liquid (L) flowing in any of the feed ports (3) and / or discharge ports (5) of a plurality of feed ports (3) which feed the washing liquid (L) to the washing tank (2) and plurality of discharge ports (5) which discharge washing liquid (L) from the washing tank (2), the washing liquid (L) inside the washing tank (2) can be set so as to run in a laminar flow state.

Description

technical field [0001] The present invention relates to components suitable for use in, for example, substrates for magnetic recording media and / or magnetic recording media, magnetic recording media manufacturing devices, baffle plates (shield plates) of sputtering devices, etc. as objects to be cleaned A flow-type cleaning method and a flow-type cleaning device suitable for use during cleaning. [0002] This application is based on Japanese Patent Application No. 2009-119003 for which it applied in Japan on May 15, 2009, and the priority is claimed, The content is used here. Background technique [0003] For example, a disk-shaped aluminum substrate, a glass substrate, or the like formed with a center hole is used as a substrate for a magnetic recording medium used in a hard disk drive or the like. Since the substrate for a magnetic recording medium is produced by subjecting the surface to various surface treatment processes such as polishing, a substrate cleaning process ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/84B08B3/12
CPCB08B3/102B08B3/12G11B5/8404H01L21/67057
Inventor 坂口龙二大岛德夫王志鹏田中良
Owner RESONAC HOLDINGS CORPORATION