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Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber

A technology of chemical vapor deposition and multi-layer products, which is applied in the direction of gaseous chemical plating, coating, metal material coating technology, etc., can solve the problems of increased output, low production efficiency, high production cost, etc., and achieve production efficiency and cost savings The effect of improving and improving production efficiency, reducing trouble and manpower

Active Publication Date: 2012-04-25
山东国晶新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Now most of them focus on the single-layer fixture design that can not only ensure the coating quality, but also increase the number of products. However, due to the influence of objective conditions such as the diameter of the furnace, the increase in output is very limited simply by adding brackets.
Generally speaking, the design and use of fixtures with various single-layer structures, the number of products in single-furnace production is still small, the production efficiency is low, and the production cost is high.

Method used

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  • Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber
  • Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber
  • Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] A multi-layer product support for chemical vapor deposition, with a structure such as figure 1 , figure 2 As shown, it includes a unit layer composed of a circular sleeve 1, an air distribution disc 2 and a pole 3; the structure of the unit layer is that the air distribution disc 2 is placed on the circular sleeve 1, and the outer diameter of the circular sleeve 1 is the same as the The gas discs 2 have the same diameter. The support rod 3 is fixed upright on the air distribution plate 2, and the circular sleeve 1 of another unit layer is placed on the air distribution plate 2 of one unit layer, and a total of 3 unit layers are arranged layer by layer; wherein, the circular sleeve The upper part of the wall of cylinder 1 is symmetrically provided with two rectangular notches 5 as gas circulation channels; the support rod is a tungsten needle, and the bottom end of the tungsten needle is fixed in the concave hole on the gas distribution plate. The substrate on which t...

Embodiment 2

[0042] A chemical vapor deposition multilayer product support, as described in Example 1, the difference is that there are 4 unit layers; wherein, the upper part of the wall of the circular sleeve 1 is symmetrically provided with two arc-shaped notches as A gas circulation channel; the tungsten needles fixed on the gas distribution plate are supported by 4 tungsten needles per substrate. The circular sleeve is made of graphite, with a wall thickness of 8 mm, and the height is 25 mm from the top of the substrate to the gas distribution plate of another unit layer after the tungsten needle is fixed on the gas distribution plate to support the substrate.

Embodiment 3

[0044] A chemical vapor deposition reaction chamber, comprising a reaction chamber cavity 7 and the multilayer product support described in Embodiment 1, the multilayer product support is placed on the gas distribution plate 8 on the air inlet 9 in the chamber Above, the gas inlet 9 is located at the bottom of the reaction chamber, and the gas outlet 10 is located at the top of the reaction chamber relative to the gas inlet 9 . It is used as a chemical vapor deposition equipment with a vacuum degree of 200-5000 Pa.

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Abstract

The present invention relates to a multi-layer product support for vapor deposition, and a chemical vapor deposition reaction chamber. The multi-layer product support comprises unit layers, wherein the unit layer comprises a round sleeve, a gas distribution disk and a support rod. The structure of the unit layer is characterized in that: the gas distribution disk is arranged on the round sleeve; the support rod is vertically fixed on the gas distribution disk, and is provided for supporting a substrate requiring coating; the round sleeve of the one unit layer is placed on the gas distributiondisk of the other unit layer; the upper part of the round sleeve wall is symmetrically provided with two notches, wherein the gas can conveniently flow by the notches. According to the chemical vapordeposition reaction chamber, the multi-layer product support is placed on an incoming gas distribution plate on the gas inlet inside the cavity; the gas inlet is positioned on the bottom of the reaction chamber; the position of the gas outlet is relative to the position of the gas inlet, and the gas outlet is positioned on the top of the reaction chamber. The quality of the coating product produced by the multi-layer product support of the present invention is uniform, the number of the coating product is increased by several times, and the production efficiency is improved.

Description

technical field [0001] The invention relates to a production fixture in a gas phase deposition chamber, in particular to a multilayer product support and a chemical vapor deposition reaction chamber for production in a gas phase deposition furnace with a multilayer structure. Background technique [0002] The chemical vapor deposition (CVD) method is considered to be the most promising coating preparation method for SiC because of its excellent adaptability to parts with complex shapes and internal surfaces, and the coating can be prepared at relatively low temperatures . [0003] The application number filed by Xinwang Magnetic Materials Co., Ltd. on September 29, 1999 is 200510004777.6, and the name is "product support used in vapor deposition equipment". The product holder is mainly used to support planar samples. The product holder of the present invention includes a tubular body whose inner diameter is sized to hold the product. The body is made of stainless steel wire...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/458C23C16/32C23C16/42
Inventor 刘汝萃刘汝强
Owner 山东国晶新材料有限公司
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