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Cleaning device and cleaning method of glass substrate

A technology for glass substrates and cleaning devices, applied in liquid cleaning methods, cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems of poor cleaning effect and high cost, and achieve good cleaning effect, low cost, and low cost higher effect

Inactive Publication Date: 2012-06-13
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] The object of the present invention is to provide a high-efficiency, low-cost ultrasonic cleaning device and cleaning method for glass substrates to solve the technical problems of high cost and poor cleaning effect of existing glass substrate cleaning devices and cleaning methods

Method used

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  • Cleaning device and cleaning method of glass substrate
  • Cleaning device and cleaning method of glass substrate
  • Cleaning device and cleaning method of glass substrate

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Embodiment Construction

[0030] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced.

[0031] figure 1 It is a structural schematic diagram of a preferred embodiment of the glass substrate cleaning device of the present invention, figure 2 for figure 1 Schematic diagram of the structure of the A-A section, image 3 for figure 1 Schematic diagram of the structure of the B-B section. The present invention relates to a glass substrate cleaning device 100, the glass substrate cleaning device 100 includes a cleaning tank 110 and a first frequency generator 121 and a second frequency generator 122 arranged on both sides of the cleaning tank 110, wherein the first frequency The generator 121 is used to send out ultrasonic waves with a first frequency, and the second frequency generator 122 is used to send out ultrasonic waves with a second frequency.

[0032] When cleaning, the substr...

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Abstract

The invention relates to a cleaning device and a cleaning method of a glass substrate. The cleaning device of the glass substrate, provided by the invention, comprises a cleaning groove, a first frequency generator used for sending ultrasonic wave with a first frequency and a second frequency generator used for sending ultrasonic wave with a second frequency, wherein the first frequency generator and the second frequency generator are arranged on the both sides of the cleaning groove. In the invention, the glass substrate is cleaned by utilizing the ultrasonic waves with different frequencies, so that the cost is reduced and the good cleaning effect is realized.

Description

technical field [0001] The invention relates to the field of substrate cleaning, in particular to an efficient and low-cost glass substrate cleaning device and cleaning method. Background technique [0002] In the current liquid crystal display field, in terms of cleaning the glass substrate used to make the liquid crystal display panel, different cleaning techniques are used for particles of different particle sizes. Generally, plasma cleaning (Plasma) is used to remove organic residues on the glass substrate. Use brush spray (brush+shower) to remove particles with a particle size of 10 microns or more on the glass substrate, use pressure jetting to remove particles with a particle size of 1-10 microns on the glass substrate, and use dual-fluid spray to remove glass substrates Particles with an upper particle size of 1-5 microns. [0003] However, with the development requirements of large size, high aperture ratio and low line width of liquid crystal display panels, in or...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/12B08B11/04
CPCB08B11/04B08B3/12
Inventor 寇浩
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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