Cleaning device and cleaning method of glass substrate
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
- Publication Date
- 2012-06-13
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the field of substrate cleaning, in particular to an efficient and low-cost glass substrate cleaning device and cleaning method. Background technique
[0002] In the current liquid crystal display field, in terms of cleaning the glass substrate used to make the liquid crystal display panel, different cleaning techniques are used for particles of different particle sizes. Generally, plasma cleaning (Plasma) is used to remove organic residues on the glass substrate. Use brush spray (brush+shower) to remove particles with a particle size of 10 microns or more on the glass substrate, use pressure jetting to remove particles with a particle size of 1-10 microns on the glass substrate, and use dual-fluid spray to remove glass substrates Particles with an upper particle size of 1-5 microns.
[0003] However, with the development requirements of large size, high aperture ratio and low line width of liquid crystal display panels, in or...