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Heavy metal ion measurement method and heavy metal ion measurement device

A heavy metal ion and measuring device technology, which is applied in the direction of material electrochemical variables, can solve the problems of heavy metal ion concentration measurement accuracy limitations, and achieve the effects of preventing dissolution, reducing impact, and high-precision measurement

Inactive Publication Date: 2012-07-11
HORIBA LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, in recent years when the sensitivity of the working electrode has been further improved, the working electrode has sensitivity to a small amount of impurities contained in the liquid sample even when the impurities are removed by the filter. There are limitations in measurement accuracy

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  • Heavy metal ion measurement method and heavy metal ion measurement device
  • Heavy metal ion measurement method and heavy metal ion measurement device
  • Heavy metal ion measurement method and heavy metal ion measurement device

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Embodiment Construction

[0051] One embodiment of the heavy metal ion measuring device of the present invention will be described below with reference to the drawings.

[0052] The heavy metal ion measuring device 100 of the present embodiment is a device for measuring the concentration of heavy metal ions contained in a liquid sample using stripping voltammetry using a three-electrode system of a counter electrode, a reference electrode, and a working electrode. For example, the heavy metal ion measuring device 100 of the present embodiment measures any one component or multiple components of heavy metal ions such as Cu, As, Cd, and Zn contained in a liquid sample.

[0053]

[0054] Specifically, as figure 1 As shown, the heavy metal ion measuring device 100 includes: a measuring cell 2, which accommodates a liquid sample; a counter electrode 3, which is set in contact with the liquid sample; a reference electrode 4; a working electrode 5; a potential changing part 6, which makes the potential of t...

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Abstract

The invention provides a heavy metal ion measurement method and a heavy metal ion measurement device, wherein measurement error caused by impurities in a liquid sample can be reduced, while the exsolution and disbanding of electrodeposited heavy metal due to the liquid replacement can be avoided. Therefore, the concentration of heavy metal ions can be measured at a high precision. After the heavy metal deposits on a conductive diamond electrode (5), when the reduction potential of the conductive diamond electrode (5) is lower than the reduction potential of the heavy metal as the measurement object, the liquid sample is at least partially displaced into acetic acid buffer solution. Then, the potential of the conductive diamond electrode (5) is scanned toward a higher reduction potential. Therefore, the heavy metal electrodeposited on the conductive diamond electrode (5) is dissolved into the acetic acid buffer solution.

Description

technical field [0001] The present invention relates to a heavy metal ion measuring method and a heavy metal ion measuring device for measuring the concentration of heavy metal ions contained in a liquid sample. Background technique [0002] As disclosed in Patent Document 1, stripping voltammetry has conventionally been considered as a method for measuring the concentration of heavy metal ions contained in a liquid sample. [0003] The stripping voltammetry method includes: an electrodeposition process, by providing a potential lower than the reduction potential of the heavy metal contained in the liquid sample to the working electrode immersed in the liquid sample, so that the heavy metal in the liquid sample is electrodeposited at the working electrode. On the electrode; the stripping step, by sweeping the potential of the working electrode to a potential higher than the reduction potential, the heavy metal electrodeposited on the working electrode is stripped from the wo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/48
Inventor 山贯干人古市修平高松修司岛田刚志
Owner HORIBA LTD
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