A digital mask-free photoetching aligning deivce based on phase shift moire fringe

Abstract

The invention relates to a phase shift moire fringe-based digital mask-free photoetching aligning deivce which comprises a computer, an aligning light source, a digital micromirror, a photoetching object lens, a silicon chip, an imager (CCD), a displacement work platform, a first and a second color separation spectroscopes; the first color separation spectroscope receives aligned light and reflects it to a digital micromirror structure which is controlled by the computer to produce a digital grating with constant phase shift; the digital micromirror reflects the aligning light to the photoetching object lens, then the aligning light is transmitted through the second color separation spectroscope; the digital phase shift gratings are sequentially projected to a silicon chip and superposed with grating labels on the silicon chip; the silicon chip reflects the aligning light, then the aligning lightis reflected by the second color separation spectroscope, then the aligned light is received by the CCD; The CCD collects moire fringe images which are multiple frames of moire fringe images with a certain phase shift interval and produced by superposition of the phase shift digital grating with a label grating on the silicon chip.

Description

technical field [0001] The invention belongs to the technical field of maskless lithography, in particular to a maskless lithography alignment device based on a digital micromirror. Background technique [0002] With the rapid development of micro-optical, mechanical, electrical and other technologies, micro-fabrication technology has developed rapidly. Micro-optical components are widely used in the fields of communication, military, space technology, super-finishing, biomedicine, and information processing. This has led researchers to conduct extensive research on the design, fabrication and application of micro-optics. Micro-optics has made great progress in design theory and manufacturing methods. In order to further expand the application field of micro-optics components, higher requirements are put forward for its manufacturing methods. Therefore, it is still an extremely important research direction in the field of micro-optics at home and abroad to study convenient...

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved in the present invention is: according to the characteristics of maskless lithography based on digital micromirror, in order to meet the needs of the development of this lithography technology, solve the problem of complex structure, low precision, high cost and implementation problems of the existing alignment system. More difficult technical problems, the present invention proposes a digital maskless lithography alignment method and device based on phase-shifting moiré fringes. The cycle can also be combined with Fourier transform and phase shift algorithm to solve the phase, effectively improve the phase extraction accuracy, and at the same time effectively eliminate noise and improve alignment accuracy

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