Silicon PIN neutron dose detector and manufacturing method thereof
A technology of neutron dose and manufacturing method, which is applied in the direction of semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of increasing manufacturing cost and process difficulty, PIN detector defects, etc., and achieve cost reduction and process complexity The effect of reducing the requirement and increasing the effective thickness
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[0032] The present invention will be further described through specific embodiments below in conjunction with the accompanying drawings, but the scope of the present invention is not limited in any way.
[0033] The following examples are intended to be produced by a specific production method figure 2 The silicon PIN neutron dose detector shown, the silicon PIN neutron dose detector includes a double-sided polished high-resistance silicon wafer 1 as a substrate, with rectangular P-type active regions on the front and back sides of the silicon wafer 1 2 and N-type active region 3, silicon dioxide layer 4 is on the silicon surface outside the active region.
[0034] Concrete manufacturing method comprises the following steps:
[0035] 1. If Pic 4-1 As shown, high-temperature oxidation at 1000°C is carried out on the high-resistance silicon wafer 1 as the substrate, and the thickness is formed on the upper and lower surfaces of the silicon wafer. the silicon dioxide layer ...
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