Monolithic integrated sensor device, method of forming and method of forming its cavity structure
A sensor device, monolithic integration technology, applied in the field of micro-electromechanical system devices
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[0016] Embodiments relate to MEMS devices, particularly MEMS devices with associated electronics integrated on a single wafer. Embodiments utilize a modular process flow concept as part of a MEMS-first approach, enabling the use of novel cavity sealing processes. The impact and potentially harmful effects on the electronic device due to MEMS processing are thus reduced or eliminated. At the same time, a highly flexible solution is available, capable of implementing various measurement principles, including capacitive and piezoresistive. As a result, various sensor applications can have improved performance and quality while remaining cost efficient.
[0017] FIG. 1 illustrates fabrication steps of a capacitive MEMS device 100 with a localized sacrificial layer (eg, oxide). Figure 1A A silicon substrate 102 is shown with an implanted layer 104 . In one embodiment, substrate 102 is a p-type substrate and layer 104 is an n-type implanted layer, forming a pn junction. A patte...
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