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Organometallic compound purification

An organic metal and compound technology, applied in the direction of antimony organic compounds, bismuth organic compounds, zinc organic compounds, etc., can solve the problems of repeated precipitation and evaporation steps, unattractive and other problems

Inactive Publication Date: 2014-12-31
DOW GLOBAL TECH LLC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is commercially unattractive as it is only useful for certain solid organometallic compounds and is slow, requiring repeated precipitation and evaporation steps

Method used

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  • Organometallic compound purification

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] Feedstream comprising about 15-20% by weight of trimethylgallium ("TMG") with the balance being a mixture of hydrocarbon solvent and aluminum chloride complex, continuous at a flow rate of about 55 units / hour at 95-100°C Added to the first distillation column. The first distillation column has ≥ 30 theoretical stages, with most of the theoretical stripping stages and a small part of the theoretical rectifying stages, stripping and rectifying beds. The first distillation column was operated at constant temperature and pressure, and an overhead fraction sufficient to remove most of the relatively higher-boiling impurities was withdrawn from the upper portion of the column at a flow rate of about 0.5 units / hour. Sufficient reflux of the overhead fraction produces a reflux:feed ratio greater than 3 to 1. The lower part of the column is operated at constant temperature and heating level, and the remaining feed is continuously withdrawn from the bottom of the column. The bo...

Embodiment 2

[0040] The process of Example 1 was repeated to obtain TMG with a total yield >93% and a purity of TMG >99%.

Embodiment 3

[0042] The procedure of Example 1 was repeated except that TMG was replaced by triethylgallium.

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Abstract

A method of purifying crude organometallic compounds using a plurality of distillation columns is provided. This method effectively removes both relatively more volatile impurities and relatively less volatile impurities as compared to the organometallic compound.

Description

[0001] Technical solutions [0002] The invention relates to the field of metal-containing compounds, in particular to the field of purification of metal-containing compounds. Background technique [0003] Metal-containing compounds are used in a variety of applications, such as catalysts and sources for growing metal films. One application of the compound is in the manufacture of electronic devices, such as semiconductors. Many semiconductor materials are fabricated using well-established deposition techniques using ultra-high-purity metal-organic (organometallic) compounds, for example, metal-organic vapor phase epitaxy, metal-organic molecular beam epitaxy, metal-organic Chemical vapor deposition and atomic layer deposition. To be used in these methods, organometallic compounds must be free of contaminants and / or deleterious impurities. Impurities present in the organometallic source, if not removed, can cause adverse effects on the electronic and / or optoelectronic prope...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D3/14C07F5/00C07F5/06C07F3/06C07F9/90C07F9/72C07F9/94
CPCC07F9/94C07F9/904C07F9/723C07F5/062C07F5/063C07F5/00B01D3/143C07F3/06C07F9/72C07F9/90B01D3/00B01D3/14
Inventor C·D·莫德特兰德C·D·戴维森
Owner DOW GLOBAL TECH LLC