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949 results about "Organic Metallic Compounds" patented technology

Organometallic compound, any member of a class of substances containing at least one metal-to-carbon bond in which the carbon is part of an organic group.

Vacuum-integrated hardmask processes and apparatus

Vacuum-integrated photoresist-less methods and apparatuses for forming metal hardmasks can provide sub-30 nm patterning resolution. A metal-containing (e.g., metal salt or organometallic compound) film that is sensitive to a patterning agent is deposited on a semiconductor substrate. The metal-containing film is then patterned directly (i.e., without the use of a photoresist) by exposure to the patterning agent in a vacuum ambient to form the metal mask. For example, the metal-containing film is photosensitive and the patterning is conducted using sub-30 nm wavelength optical lithography, such as EUV lithography.
Owner:LAM RES CORP

Organometallic compound and organic electroluminescent device

The invention provides an organic metal compound and an organic electroluminescent device, the organic metal compound has a structure shown in a general formula I. After the organic metal compound is used as a specific doping material of a luminescent layer and is applied to the organic electroluminescent device, the starting voltage of the device is reduced, the luminous efficiency is improved, and the service life is prolonged.
Owner:JILIN OPTICAL & ELECTRONICS MATERIALS CO LTD

Organic electroluminescence device and organometallic compound for organic electroluminescence device

An organic electroluminescence device is provided and including a first electrode, a hole transport region disposed on the first electrode, an emission layer disposed on the hole transport region, an electron transport region disposed on the emission layer, and a second electrode disposed on the electron transport region, wherein the emission layer may include an organometallic compound, thereby exhibiting high luminous efficiency and long service life characteristics.
Owner:SAMSUNG DISPLAY CO LTD

Method for improving self-reconstruction degree of electrolyzed water catalyst under assistance of magnetic field, prepared catalyst and application of catalyst

The invention belongs to the field of hydrogen production through water electrolysis, and particularly relates to a method for improving the self-reconstruction degree of a water electrolysis catalyst through assistance of a magnetic field, the prepared catalyst and application of the catalyst. The method comprises the following steps: 1) adding a solvent into ferrous salt, cobalt salt, sodium salt, a nitrogen compound and an organic metal compound, and uniformly mixing to obtain a hydrothermal reaction medium; (2) cutting, cleaning and drying a base material, immersing the base material in a hydrothermal reaction medium, carrying out hydrothermal reaction, and cleaning and drying to obtain an electrode plate; 3) assembling the electrode plates into an electrolytic tank, and performing magnetic field-assisted activation to obtain the electrolyzed water catalyst electrode material with high self-reconfiguration degree. According to the catalyst prepared by the invention, high overpotential and polarization intensity in oxygen evolution reaction can be effectively reduced through high self-reconfiguration, and the catalyst has low Tafel slope and high catalytic activity.
Owner:ZHEJIANG UNIV OF TECH

Multi-metal borate nanoparticles as well as preparation method and application thereof

The invention discloses a multi-metal borate nano-particle as well as a preparation method and application thereof. The preparation method comprises the following steps: in the presence of small molecules with alkyl chains, performing high-temperature thermal decomposition on an organic metal compound or a metal salt compound precursor and organic borate in a solvent, and then centrifuging, modifying, performing ultrafiltration, dialyzing and purifying to obtain the multi-metal borate nanoparticles. The preparation method disclosed by the invention has the characteristics of mildness, high efficiency and strong controllability. The multi-metal borate nanoparticles prepared by the preparation method disclosed by the invention have the advantages of monodisperse size, relatively high magnetic property and good biocompatibility. Therefore, the prepared multi-metal borate nanoparticles not only have multi-modal imaging functions such as magnetic resonance imaging, near-infrared two-region imaging, nuclear medicine imaging and magnetic particle imaging, but also can be used for various treatment means such as magnetocaloric therapy and boron neutron capture therapy; potential advantages are realized in biomedical applications such as magnetic targeting tumor treatment and imaging contrast agents, and high practical values are realized.
Owner:SUZHOU UNIV

Lithium-doped silicon-carbon composite material, preparation method thereof, negative plate and lithium ion battery

The invention relates to the technical field of lithium ion batteries, in particular to a lithium-doped silicon-carbon composite material, a preparation method thereof, a negative plate and a lithium ion battery. The preparation method of the lithium-doped silicon-carbon composite material comprises the following steps: carrying out reduction reaction and activated pore-forming on a mixed material containing a carbon source, an organic pore-forming agent, a lithium supplement agent and a reducing agent to obtain lithium-doped porous carbon; performing first deposition on the lithium-doped porous carbon and mixed gas containing an inorganic lithium compound and an organic lithium compound; carrying out second deposition on the material obtained after the first deposition and silane gas to obtain a lithium compound doped silicon carbon precursor material; and mixing the lithium compound doped silicon carbon precursor material, an organic metal compound, asphalt and an organic solvent, performing spray drying, and then performing carbonization. According to the preparation method, the initial efficiency and the power performance of the silicon-carbon composite material can be improved.
Owner:SVOLT ENERGY TECHNOLOGY CO LTD

Semiconductor photoresist compositions and methods of forming patterns using the composition

A semiconductor photoresist composition and a method of forming patterns using the semiconductor photoresist composition are disclosed. The semiconductor photoresist composition may include a tin (Sn)-containing organometallic compound, deuterium oxide (D2O), and a solvent.
Owner:SAMSUNG SDI CO LTD

Light-emitting device including organometallic compound, electronic apparatus including the light-emitting device, and the organometallic compound

A light-emitting device includes a first electrode, a second electrode facing the first electrode, an interlayer between the first electrode and the second electrode, and an organometallic compound represented by Formula 1. In addition, there are provided an electronic apparatus including the light-emitting device, and the organometallic compound represented by Formula 1.
Owner:SAMSUNG DISPLAY CO LTD

Light-emitting device including organometallic compound, electronic apparatus including the light-emitting device, and the organometallic compound

A light-emitting device including an organometallic compound having a metal such as is platinum (Pt), palladium (Pd), copper (Cu), silver (Ag), gold (Au), rhodium (Rh), ruthenium (Ru), osmium (Os), titanium (Ti), zirconium (Zr), hafnium (Hf), europium (Eu), terbium (Tb), or thulium (Tm) is provided. The light-emitting device may include a first electrode, a second electrode facing the first electrode, an interlayer between the first electrode and the second electrode and comprising an emission layer. The light-emitting device may be included in an electronic apparatus.
Owner:SAMSUNG DISPLAY CO LTD

Organometallic compound and organic electroluminescent device containing same

The invention belongs to the field of organic photoelectric materials, and discloses an organic metal compound and an organic electroluminescent device containing the same. The structure of the organic metal compound is as shown in a formula I: # imgabs0 #. The organic metal compound provided by the invention is used as a material in a light-emitting layer, so that the driving voltage of a device can be reduced, the service life of the device can be prolonged, and the stability is good.
Owner:JILIN OPTICAL & ELECTRONICS MATERIALS CO LTD

Surface-treated cutting blades demonstrating extended blade edge retention and decreased friction, and methods of reducing deposition of a contaminant on a surface of a metal cutting blade

Surface-treated cutting blades are provided, comprising: (a) a metal cutting blade body; and (b) a self-assembled monolayer formed from an alkoxysilane and / or organophosphonic acid. The surface-treated cutting blades may further comprise one or more layers formed from chrome, tantalum, titanium, an aqueous solution of a metal salt, and / or an organometallic compound, applied between the cutting blade and the self-assembled monolayer. Also provided is a method of reducing deposition of a contaminant on a surface of metal cutting blade, comprising: (a) contacting the surface either directly or through an intermediate organometallic layer with a fluorinated material in a diluent; (b) forming a film on the surface; and (c) exposing the cutting blade to the contaminant.
Owner:ACULON INC

Semiconductor photoresist composition and method of forming patterns using the same

To provide a semiconductor photoresist composition that exhibits excellent sensitivity and improved stability, as well as a method of forming patterns using the same.SOLUTION: The present invention provides a semiconductor photoresist composition that includes an organometallic compound represented by Chemical Formula 1 and a solvent, as well as a method of forming patterns using the same. The details of Chemical Formula 1 are as described in the specification.SELECTED DRAWING: Figure 5
Owner:SAMSUNG SDI CO LTD

Semiconductor photoresist composition and methods of forming patterns using the composition

A semiconductor photoresist composition and a method of forming or providing patterns using the semiconductor photoresist composition are disclosed. The semiconductor photoresist composition may include a first organometallic compound represented by Chemical Formula 1, a second organometallic compound represented by Chemical Formula 2, and a solvent.
Owner:SAMSUNG SDI CO LTD

Organometallic compound and organic electroluminescent device containing same

The invention provides an organic metal compound and an organic light-emitting device comprising the same, and belongs to the field of organic photoelectric materials, the organic metal compound has a structure shown in a general formula I. The organic metal compound has a structure shown in a general formula I by changing the combination of substituent groups on 2-(dibenzo [b, d] furan-4-yl) pyridine, and the organic light-emitting device with the organic metal compound can be obtained by synthesizing 2-(dibenzo [b, d] furan-4-yl) pyridine. The organic metal compound is generated by adding-CN,-F, branched alkyl, substituted or non-substituted aryl and substituted or non-substituted naphthenic base, intermolecular spatial configuration is improved, the organic metal compound has good space twisting capability, carrier migration is avoided, and after the organic metal compound serves as a specific doping material of a luminescent layer and is applied to an organic electroluminescent device, the organic electroluminescent device has high luminous efficiency. The driving voltage of the device is reduced, so that carrier migration is avoided, the driving voltage is obviously reduced, the luminous efficiency is obviously improved, and the service life is obviously prolonged.
Owner:JILIN OPTICAL & ELECTRONICS MATERIALS CO LTD

Organotin alkoxides as precursors for patterning compositions with fluorine substituents and carbon-carbon double bonds

Organotin compositions suitable for radiation based patterning have ligands providing fluorinated groups and unsaturated carbon-carbon bonds, such as C═C bonds. The fluorinated groups and unsaturated carbon-carbon bonds may or may not be located on the same ligand. Blends of precursors with different ligands provide added flexibility with respect to precursor design. Fluorinated organometallic compounds can be represented by the formula RUFSn(OR′)3, wherein RUF is an organo group with 1 to 31 carbon atoms with at least one C═C bond and at least one fluorine atom bonded to a carbon, with the organo group forming a C—Sn bond, wherein R′ is an organo group with 1 to 10 carbon atoms. Precursors are suitable for solution based deposition or vapor based deposition.
Owner:INPRIA CORP

Organic electroluminescent materials and devices

Provided are organometallic compounds comprising a ligand containing triptycene moieties. Also provided are formulations comprising these organometallic compounds. Further provided are organic light emitting devices (OLEDs) as well as related consumer products that utilize these organometallic compounds.
Owner:UNIVERSAL DISPLAY CORP

Semiconductor photoresist composition and method of forming pattern using the same

Disclosed are a semiconductor photoresist composition and a method of forming or providing a pattern using the same. The semiconductor photoresist composition may include an organometallic compound represented by Chemical Formula 1 and a solvent. Chemical formula 1
Owner:SAMSUNG SDI CO LTD

Methods of increasing oil production from a subterranean formation, method of hydraulic fracturing, and surface treatment compositions used therein

The present invention provides methods of increasing oil production, hydraulic fracturing, and carbon sequestration in subterranean formations. Surface treatment compositions used in these methods are also disclosed. The methods comprise: (1) injecting into the well the surface treatment composition with or without a pretreatment; (2) allowing one or more components of the surface treatment composition to chemically bond to a surface of the subterranean formation; and (3) removing oil from the well or from one or more production wells that are in fluid communication with the well. The surface treatment composition comprises (a) a fluid comprising a hydrocarbon liquid, a supercritical fluid, and / or a liquefied gas; and (b) a surface modifying component. The component (b) comprises (i) an organometallic compound and (ii) an organosilane having halogen substituents. In carbon sequestration, the fluid (a) contains carbon dioxide.
Owner:ACULON INC

Organometallic compound, organic light-emitting device including same, and electronic device including organic light-emitting device

Disclosed are an organometallic compound, an organic light-emitting device including the same, and an electronic device including the organic light-emitting device. The organometallic compound is represented by Formula 1, where M1 is a transition metal, L1 is a ligand represented by Formula 1A, L2 is a ligand represented by Formula 1B, and n1 and n2 are each independently 1 or 2, where X43 is C (R43), N, or C bonded to Y3; x44 is C (R44), N, or C bonded to Y2 or Y3; x45 is C (R45), N, or C bonded to Y2 or Y3; and X46 is C (R46), N, or C bonded to Y2, where i) X43 is C bonded to Y3 and X44 is C bonded to Y2; ii) X44 is C bonded to Y3, and X45 is C bonded to Y2; or iii) X45 is C bonded to Y3, and X46 is C bonded to Y2, and the remaining groups and variables are as described herein. Formula 1M1 (L1) n1 (L2) n2 # imgabs 0 # and formula 2 # imgabs 1 #
Owner:SAMSUNG DISPLAY CO LTD

Photoresist composition and method of manufacturing semiconductor device using the same

The inventive concept provides a photoresist composition containing an organometallic compound represented by General Formula 1 and a solvent,(MR11R12)a(L)b(OB)c,  [General Formula 1]wherein, in General Formula 1, M is a central metal, R11 and R12 are each independently selected from an alkyl group, an aryl group, a heteroaryl group, an allyl group, an alkoxy group, an amino group, a sulfido group, and a halogen group, L is an organic ligand that is a polydentate ligand containing two hydrophobic moieties interconnected by a bridge moiety, B is selected from a hydrogen atom, an alkyl group, and an aryl group, or is omitted, a is an integer between 1 and 8, b is an integer between 1 and 4, c is an integer between 0 and 4, a sum of b and c is an integer between 1 and 4.
Owner:UI (UNIVERSITY IND FOUNDATION) YONSEI UNIVERSITY +1

Resist composition and method of forming pattern using the same

Provided are a resist composition including an organometallic compound represented by the following Formula 1 and an additive represented by the following Formula 2, and a pattern formation method using the same:wherein in Formulae 1 and 2, M11, Rx, Ry, n, m, A21, L21 to L23, a21 to a23, R21, R22, b21, b22, X21, o, p and q are as described in the specification.
Owner:SAMSUNG ELECTRONICS CO LTD

Light emitting device including organometallic compound, electronic device and electronic apparatus including same, and organometallic compound

A light emitting device, an electronic device, an electronic apparatus, and an organometallic compound including an organometallic compound having a metal such as platinum (Pt), palladium (Pd), copper (Cu), silver (Ag), gold (Au), rhodium (Rh), ruthenium (Ru), osmium (Os), titanium (Ti), zirconium (Zr), hafnium (Hf), europium (Eu), terbium (Tb), or thulium (Tm) are provided. The light emitting device may include a first electrode, a second electrode facing the first electrode, and an intermediate layer between the first electrode and the second electrode and including an emission layer. A light emitting device may be included in an electronic apparatus.
Owner:SAMSUNG DISPLAY CO LTD

Resist composition and pattern formation method using the same

Provided are a resist composition including an organometallic compound represented by Formula 1 and an additive represented by Formula 2, and a pattern formation method using the same:Descriptions of M11, Rx, Ry, n, m, X2, Y2, Z2, L2, a2, b2, and c2 in Formulae 1 and 2 are provided in the specification.
Owner:SAMSUNG ELECTRONICS CO LTD