Coated graphite article and reactive ion etch manufacturing and refurbishment of graphite article
A reactive ion and object technology, applied in the field of reactive ion etching manufacturing and repair of coated graphite objects and graphite objects, can solve the problems of wasting wafers, high cost, and extended downtime
Inactive Publication Date: 2013-02-06
ENTEGRIS INC
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Problems solved by technology
Many wafers are wasted and downtime is prolonged, which is costly to the customer
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[0038] EXAMPLES OF THE INVENTION Specific examples are described below.
[0039] In an embodiment according to the invention, a material for lining the beamline of an ion implantation tool or other tool is provided, which is useful wherever a highly conductive graphite lining is required. The material combines high-purity graphite with surface coating technology that results in fewer unwanted particles when the liner is used in ion implantation or other tools. Graphite can be optimized for implantation processes. Lining results in reduced machine downtime during preventive maintenance operations due to reduced seasoning time of the process chamber. In addition, ultra-clean liners can cause particle reduction on semiconductor wafers processed by ion implantation tools.
[0040] Due to its high conductivity, a liner according to an embodiment of the present invention reduces the tendency for charge to build up on the liner, which can deflect an ion beam used in an ion implanta...
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Abstract
In accordance with an embodiment of the invention, there is provided a coated graphite article. The article comprises graphite; and a conductive coating overlaying at least a portion of the graphite. The conductive coating comprises a through-thickness resistance of less than about 50 ohms as measured through the thickness of the graphite and the conductive coating. In accordance with another embodiment of the invention, there is provided a method for manufacturing a graphite article comprising a conductive coating. The method comprises treating graphite of the article with a reactive ion etch process; and after treating the graphite with the reactive ion etch process, applying the conductive coating over at least a portion of the graphite. In a further embodiment according to the invention, there is provided a method for refurbishing a graphite article comprising graphite and an overlaying conductive coating. The method comprises removing the overlaying conductive coating of the graphite article with a reactive ion etch process; and applying a new conductive coating over at least a portion of the graphite.
Description
[0001] Related applications [0002] This application claims the rights of U.S. Provisional Application No. 61 / 326,462, filed April 21, 2010; and claims U.S. Provisional Application No. 61 / 326,469, filed April 21, 2010; and claims 2010 Claim to U.S. Provisional Application No. 61 / 326,473, filed April 21. The entire teachings of the above applications are incorporated herein by reference. Background technique [0003] Impurities are introduced into workpieces such as semiconductor wafers using ion implantation techniques. During implantation, however, particles are produced which may contaminate the workpiece. A chamber liner can be used to line a processing chamber performing an ion implantation process as discussed in U.S. Patent Application Publication No. 2009 / 0179158 Al to Stone et al., the disclosure of which is hereby incorporated by reference in its entirety. In this article. [0004] Graphite is conventionally used as a lining for processing chambers. Every four w...
Claims
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IPC IPC(8): H01B5/14H01J37/317
CPCH01J37/3171H01B5/14C23C14/48H01J37/16Y10T428/265Y10T428/30H01J37/317
Inventor 理查德·A·库克尼雷须·困达史蒂芬·唐涅尔刘研
Owner ENTEGRIS INC