Radio-frequency (RF) power distribution device

Abstract

The invention discloses an RF power distribution device. A two-stage powder distribution unit is adopted, the RF power can be equally split into four pieces through coaxial transmission lines with specific sizes and impedance, thereby, the RF power input into the device can be effectively distributed and output, and the device can be applied to a plasma apparatus.

Description

technical field [0001] The present invention relates to a radio frequency power distribution device, and in particular to a method of using a coaxial transmission line capable of carrying high power, which can be used in a plasma apparatus (plasma apparatus), saves the number of radio frequency power generators, and produces a large area and Uniform plasma distribution. Background technique [0002] In today's semiconductor process technologies, such as fabs or chip-type solar plants, plasma-enhanced chemical vapor deposition (Plasma enhance chemical vapor deposition, PECVD) systems can achieve very high Efficient thin film deposition. [0003] In addition, the traditional microcrystalline silicon thin-film solar cell process method is to pass a large amount of hydrogen and silane into the plasma-enhanced chemical vapor deposition process for dilution, and then form a microcrystalline silicon thin film through the reaction to improve the silicon thin-film solar cell. Vario...

AI Technical Summary

Problems solved by technology

However, the multi-energy feeding point method disclosed in this patent is too complicated

However, in response to industry trends, it is inevitable to process large-area coated substrates with multiple feed-in points

Images