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Electrode introducing structure

A technology of electrodes and protective structures, applied in the direction of circuits, discharge tubes, electrical components, etc., can solve the problems of electric field and flow field fluctuations, plasma inhomogeneity, affecting the uniformity and reliability of plasma process, etc., to maintain vacuum the effect of the requirements

Active Publication Date: 2013-04-24
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

However, this electrode introduction structure is prone to plasma inhomogeneity at the edge of the hole around which the bolts are fixed, which is likely to cause short-circuit ignition between the electrode and the hole wall, and the field symmetry of the physical characteristics of this structure is relatively poor, and it is easy to generate an electric field and a flow field. fluctuations, thus affecting the uniformity and reliability of the plasma process

Method used

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Embodiment Construction

[0019] The principles and features of the present invention are described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.

[0020] like figure 1 As shown, this embodiment provides an electrode introduction structure, which is used for introducing electrodes such as radio frequency and DC power into a low-pressure process chamber, including the electrode 20 and the insulating protection structure wrapping the electrode 20. The diameter of the electrode is 0.1-50mm. The length of the insulation protection structure is 5-500mm, and the height of the insulation protection structure is 10-300mm. The insulation protection structure comprises a cylindrical first insulating sleeve 21 and a cylindrical second insulating sleeve 23 arranged below the first insulating sleeve 21, the height of the second insulating sleeve is greater than the height o...

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Abstract

The invention relates to the technical field of plasma process equipment, in particular to an electrode introducing structure. The electrode introducing structure is used for the plasma process equipment and comprises an electrode and an insulation protective structure covered on the electrode. The insulation protective structure comprises a cylindrical first insulation cover and a cylindrical second insulation cover arranged below the first insulation cover. The second insulation cover is fixed on the electrode. The first insulation cover is fixed on the upper end of a cavity cover of the plasma process equipment. The electrode introducing structure is capable of reducing or avoiding the problem of uneven plasma glow and the like caused by protection and electric insulation and the like, free from air escape under the condition of plasma glow and capable of meeting the requirement of vacuum degree of a vacuum cavity.

Description

technical field [0001] The invention relates to the technical field of plasma process equipment, in particular to an electrode introduction structure. Background technique [0002] In the plasma process equipment, the electrode introduction structure used has various forms, and the reasonable design of the electrode structure plays an important role in ensuring the reliability and stability of the vacuum pressure and electrode potential, and the uniformity and stability of the plasma process. [0003] In general, when the electrode is introduced, only the sealing with the upper cover of the chamber is considered, and it is fixed and suspended on the upper end of the process chamber with bolts. However, this electrode introduction structure is prone to plasma inhomogeneity at the edge of the hole around which the bolts are fixed, which is likely to cause short-circuit ignition between the electrode and the hole wall, and the field symmetry of the physical characteristics of t...

Claims

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Application Information

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IPC IPC(8): H01J37/32
CPCH01J37/32908
Inventor 席峰王佳李楠汪明刚夏洋
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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