32results about How to "Requirements for maintaining vacuum" patented technology

A main body structure of an electrically heated container with vacuum layer is composed of an internal container, an external casing, a sealed vacuum layer between said internal container and external casing, and an electric heater with power cord and signal lines. Its all units are welded for high sealing performance.

The invention relates to the technical field of plasma process equipment, in particular to an electrode introducing structure. The electrode introducing structure is used for the plasma process equipment and comprises an electrode and an insulation protective structure covered on the electrode. The insulation protective structure comprises a cylindrical first insulation cover and a cylindrical second insulation cover arranged below the first insulation cover. The second insulation cover is fixed on the electrode. The first insulation cover is fixed on the upper end of a cavity cover of the plasma process equipment. The electrode introducing structure is capable of reducing or avoiding the problem of uneven plasma glow and the like caused by protection and electric insulation and the like, free from air escape under the condition of plasma glow and capable of meeting the requirement of vacuum degree of a vacuum cavity.

The invention provides a nitrogen sources ionizing method applied to a gas phase deposition growth system of semiconductor materials. In a growth system of semiconductor materials such as CVD, MOCVD, HVPE and MBE, etc., an external radio frequency field is applied to ionize nitrogen sources. The high frequency electric current is applied to electrodes of capacitances or inductance coils, and the high frequency electric field is applied by a gas path arranged between the capacitance plates or circling the inductance coils to speed up electrons and ionize gas molecules to generate plasmas. The device consists of a metallic flange(1), a cooling water pipeline(2), a quartz outer cover(3), a quartz fairing(5), a metal cover(6), a parallel plate capacitor(7), a thermoelectric couple(8), graphite(9), a bleeder hole(10), a radio frequency adapter(11), a radio frequency power source(12) and an air inlet(13), wherein the metallic flange(1) and the metal cover(6) are arranged on both ends of the quartz outer cover(3), and the gas path circling the air inlet(13) or the gas path of a growth platform is provided with capacitances or inductance coupling elements.

The invention discloses a polypropylene composition which comprises, by weight parts, 100 parts of polypropylene, 10-30 parts of basic magnesium sulfate whisker, 0.1-1.0 part of foaming agent, 0.5-1.5 parts of smell adsorbent and 10-30 parts of flexibilizer. By simultaneously adding basic magnesium sulfate whisker and foaming agent of a specific content, compared with the situation that only basic magnesium sulfate whisker is added, the weight of a workpiece can be greatly reduced while the comprehensive mechanical property is not reduced, and thus the lightweight requirements of an automobile are met. By adding the smell adsorbent of a specific content and adopting single vacuum design of a twin-screw extruder, it is guaranteed that the vacuum degree requirements are not larger than -0.08 bar, micromolecular volatile matter can be pumped away, and the devolatilization effect is improved obviously. The prepared polypropylene composition is low in smell and emission characteristics, the lightweight requirements of the automobile and low-smell low-emission performances of automobile interior part materials can be met, and the application prospect is wide.

Disclosed is a cavity heating device. The cavity heating device comprises a cavity wall heating structure and/ or a slide holder heating structure. The cavity wall heating structure is arranged on the inner wall of a reaction cavity. The slide holder heating structure is arranged at the bottom of a slide holder. The cavity heating device can reduce or avoid nonuniformity caused by the fact that plasma starting is unsymmetrical in structure in the plasma etching process. An electrode fixing structure is free of air discharge under the plasma starting condition and can meet requirement of a vacuum cavity for vacuum degree.

The present invention discloses a low-odor and low-volatile automobile heavy sound insulation mat material and a preparation method thereof. The materiel comprises the following components: 12-24 parts of ethylene-propylene copolymer, 4-8 parts of linear low-density polyethylene and 64-81 parts of an inorganic filler. The preparation method comprises the following steps: after mixing the materials, feeding the mixture into a twin screw extruder for melt extrusion, granulating, drying, cooling and package to obtain the material, wherein, the twin screw extruder is designed in a double-vacuum manner, and the requirement of a vacuum degree is less than or equal to -0.05 bar. According to the method disclosed by the present invention, by using the ethylene-propylene copolymer and the linear low density polyethylene to replace a conventional ethylene-vinyl acetate copolymer and ethylene-octene copolymer, the odor and volatile matters of the material are significantly improved; and the prepared and obtained vehicle heavy sound insulation mat material has the advantages of low odor, low volatile and the like, can meet the requirement of each big host factory for an automobile interior material, and has a wide application prospect.

The invention discloses a vacuuming control method and a system of ITO-PVD equipment, wherein the method comprises the following steps: a transmission cavity in the ITO-PVD equipment is set as a default cavity of a system dry pump, and is not allocated with a cold pump, and a cold pump is allocated for an ITO process cavity; for the default cavity, when other cavities besides the default cavity do not occupy the system dry pump, the system dry pump continuously vacuums the default cavity; and in the processing procedure, when the cavity in the ITO-PVD equipment requests for vacuuming, the vacuuming is performed according to the cold pump allocating condition of the cavity. The method saves the equipment cost and can effectively prevent the collision between hardware equipment when guaranteeing the vacuum degree requirement in the equipment processing.

The invention relates to an electron beam exposure machine film clip library system with encoding identification, which is composed of a Z-direction motion stage, a film frame which is used for placing film clips, a gear box, an ascending and descending stage and a computer control system, a drive motor drives a gear in the gear box to rotate under the control of the computer control system, thus driving the Z-direction motion stage to do the Z-direction motion and allowing the film frame to do the Z-direction motion, the film clips on the film frame are driven to move upward or downward to the film receiving position of a valve port, the film clips are selectively sent to a film carrying stage for carrying out the exposure, at this time, the valve port and a door of the film clip library are closed simultaneously, the valve port is opened after the completion of the exposure of one film clip, then the film clip is retaken to the film clip library for preservation, and the exposure valve port is immediately closed; the computer control system further controls the Z-direction motion stage to move upward or downward to the position of the next film clip which needs to be exposed, then the valve port is opened again to carry out the exposure of the next film clip, and the process revolves like this till the film clips are completely exposed. The electron beam exposure machine film clip library system shortens the time of sending and taking the films, improves the positioning precision of sending and taking the films and ensures the exposure quality of the film clips.

The invention discloses a system for detecting the number of fallen particles during the working process of a valve, comprising a vacuum device, a to-be-detected valve, a to-be-detected valve drivingdevice, a gas injecting device and a particle counter, wherein the vacuum device comprises a cavity and a vacuuming device; the to-be-detected valve driving device is connected to the to-be-detected valve; the to-be-detected valve is placed in the cavity; and the vacuum device is connected to the gas injecting device and the particle counter. The system can detect the number of fallen particles during the working process of the valve, so that a manufacturer and a purchaser of the valve can accurately understand the number of the fallen particles of the valve, thereby solving the problem that the quality of a semiconductor or photovoltaic module is affected because the number of the fallen particles of the valve does not meet a requirement.

The invention discloses a chip carrier and belongs to the technical field of plasma body processes. The chip carrier comprises a cavity, a cavity upper cover, an electrode, a chip fixing disc, a fixing disc supporting ring and a supporting disc. A chip fixing structure of the chip carrier comprises the chip fixing disc and the fixing disc supporting ring. An unevenness phenomenon caused by an asymmetric structure when a plasma body is started can be reduced or avoided, and a gas homogenizing structure is simplified. Under the starting condition of the plasma body, the chip carrier does not cause a gas escape phenomenon, so that the requirement of a chip for the cavity vacuum degree can be kept.