Electron-beam exposure device film jacket library system

Abstract

The invention relates to an electron beam exposure machine film clip library system with encoding identification, which is composed of a Z-direction motion stage, a film frame which is used for placing film clips, a gear box, an ascending and descending stage and a computer control system, a drive motor drives a gear in the gear box to rotate under the control of the computer control system, thus driving the Z-direction motion stage to do the Z-direction motion and allowing the film frame to do the Z-direction motion, the film clips on the film frame are driven to move upward or downward to the film receiving position of a valve port, the film clips are selectively sent to a film carrying stage for carrying out the exposure, at this time, the valve port and a door of the film clip library are closed simultaneously, the valve port is opened after the completion of the exposure of one film clip, then the film clip is retaken to the film clip library for preservation, and the exposure valve port is immediately closed; the computer control system further controls the Z-direction motion stage to move upward or downward to the position of the next film clip which needs to be exposed, then the valve port is opened again to carry out the exposure of the next film clip, and the process revolves like this till the film clips are completely exposed. The electron beam exposure machine film clip library system shortens the time of sending and taking the films, improves the positioning precision of sending and taking the films and ensures the exposure quality of the film clips.

Description

technical field [0001] The invention relates to a film folder system for an electron beam exposure machine with code identification, which is mainly used in the electron beam exposure machine, and can be widely used in the storage and retrieval of multi-layer workpieces of the same specification at fixed positions in industrial automation. technical background [0002] Nanotechnology, which was developed more than ten years ago, has become the most active frontier subject area that attracts people's attention. The electron beam exposure machine is an important means to generate nanometer patterns and make mask plates, and it is playing an increasingly important role. Among the many factors affecting the performance and quality of the electron beam exposure machine, the film holder system of the electron beam exposure machine plays a very important role. After exposure, the exposed film holders on the film receiving platform are retrieved to the film holder storage through t...

AI Technical Summary

Problems solved by technology

[0004] The problem solved by the technology of the present invention is: in order to overcome the error problems caused by intermediate links such as low production efficiency and poor positioning accuracy of the film holder due to the limitation of the exposure quality of the film holder

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