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Electron-beam exposure device film jacket library system

A technology of electron beam exposure and film holder, which is applied in microlithography exposure equipment, photolithography exposure device, electrical program control, etc., can solve the problems of low production efficiency, poor positioning accuracy of taking and placing film holders, etc., and achieve easy operation , Easy to install and adjust, to ensure the effect required by the vacuum degree

Inactive Publication Date: 2008-09-10
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The problem solved by the technology of the present invention is: in order to overcome the error problems caused by intermediate links such as low production efficiency and poor positioning accuracy of the film holder due to the limitation of the exposure quality of the film holder, an electron beam exposure with code identification is provided. Film clip library system, which shortens the time for sending and taking films, improves the positioning accuracy of sending and taking films, ensures the exposure quality of film holders, and improves production efficiency

Method used

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  • Electron-beam exposure device film jacket library system
  • Electron-beam exposure device film jacket library system
  • Electron-beam exposure device film jacket library system

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Embodiment Construction

[0023] Such as figure 1 , 2 , Shown in 13 and 14, the present invention is made up of Z direction motion table 11, the sheet frame 12 that is used to place film clip, gear case 13, lifting table 14, coding identification assembly 15, computer control system 16. The Z-direction motion table 11, the film frame 12 and the code identification assembly 15 are located in the film folder storehouse 17, and the film frame 12 is placed on the Z-direction motion table 11 during work, and the code identification assembly 15 is installed on the inside of the film folder storehouse 17, and the film clip storehouse One side of 17 has exposure valve port 18. When the Z-direction motion table 11 moves up and down, the code recognition component 15 can identify the position of the exposure valve port 18 facing the Z-direction motion table 11, so as to accurately identify which film holder the exposure valve port 18 is located in the film holder 12 Position; Can also accurately distinguish wh...

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Abstract

The invention relates to an electron beam exposure machine film clip library system with encoding identification, which is composed of a Z-direction motion stage, a film frame which is used for placing film clips, a gear box, an ascending and descending stage and a computer control system, a drive motor drives a gear in the gear box to rotate under the control of the computer control system, thus driving the Z-direction motion stage to do the Z-direction motion and allowing the film frame to do the Z-direction motion, the film clips on the film frame are driven to move upward or downward to the film receiving position of a valve port, the film clips are selectively sent to a film carrying stage for carrying out the exposure, at this time, the valve port and a door of the film clip library are closed simultaneously, the valve port is opened after the completion of the exposure of one film clip, then the film clip is retaken to the film clip library for preservation, and the exposure valve port is immediately closed; the computer control system further controls the Z-direction motion stage to move upward or downward to the position of the next film clip which needs to be exposed, then the valve port is opened again to carry out the exposure of the next film clip, and the process revolves like this till the film clips are completely exposed. The electron beam exposure machine film clip library system shortens the time of sending and taking the films, improves the positioning precision of sending and taking the films and ensures the exposure quality of the film clips.

Description

technical field [0001] The invention relates to a film folder system for an electron beam exposure machine with code identification, which is mainly used in the electron beam exposure machine, and can be widely used in the storage and retrieval of multi-layer workpieces of the same specification at fixed positions in industrial automation. technical background [0002] Nanotechnology, which was developed more than ten years ago, has become the most active frontier subject area that attracts people's attention. The electron beam exposure machine is an important means to generate nanometer patterns and make mask plates, and it is playing an increasingly important role. Among the many factors affecting the performance and quality of the electron beam exposure machine, the film holder system of the electron beam exposure machine plays a very important role. After exposure, the exposed film holders on the film receiving platform are retrieved to the film holder storage through t...

Claims

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Application Information

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IPC IPC(8): G03F7/20G05B19/04G05D3/20
Inventor 王淑蓉王肇志张正荣邢薇赵立新胡松唐小萍
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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