Electron-beam exposure device film jacket library system
A technology of electron beam exposure and film holder, which is applied in microlithography exposure equipment, photolithography exposure device, electrical program control, etc., can solve the problems of low production efficiency, poor positioning accuracy of taking and placing film holders, etc., and achieve easy operation , Easy to install and adjust, to ensure the effect required by the vacuum degree
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[0023] Such as figure 1 , 2 , Shown in 13 and 14, the present invention is made up of Z direction motion table 11, the sheet frame 12 that is used to place film clip, gear case 13, lifting table 14, coding identification assembly 15, computer control system 16. The Z-direction motion table 11, the film frame 12 and the code identification assembly 15 are located in the film folder storehouse 17, and the film frame 12 is placed on the Z-direction motion table 11 during work, and the code identification assembly 15 is installed on the inside of the film folder storehouse 17, and the film clip storehouse One side of 17 has exposure valve port 18. When the Z-direction motion table 11 moves up and down, the code recognition component 15 can identify the position of the exposure valve port 18 facing the Z-direction motion table 11, so as to accurately identify which film holder the exposure valve port 18 is located in the film holder 12 Position; Can also accurately distinguish wh...
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