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Charged particle detection system and multi-beamlet inspection system

A technology for charged particles and detection systems, applied in circuits, discharge tubes, electrical components, etc., to solve problems such as non-incidence

Active Publication Date: 2013-04-24
CARL ZEISS MICROSCOPY GMBH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The energy filter allows secondary electrons with energy above the threshold to pass through the filter and is incident on the detector, but rejects secondary electrons with kinetic energy below the threshold energy from being incident on the detector

Method used

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  • Charged particle detection system and multi-beamlet inspection system
  • Charged particle detection system and multi-beamlet inspection system
  • Charged particle detection system and multi-beamlet inspection system

Examples

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Embodiment Construction

[0025] In the example embodiments described below, functionally and structurally similar components are denoted by like reference numerals as far as possible. Therefore, in order to understand the characteristics of individual components of a particular embodiment, reference should be made to the description of other embodiments of the invention and the summary.

[0026] figure 1 A schematic diagram symbolically showing the basic functions and features of the multi-beamlet inspection system. The inspection system generates multiple beamlets of primary electrons which are incident on the substrate to be inspected to generate secondary electrons emitted from the surface which are then detected. While the illustrated embodiment uses electrons as primary particles incident on the substrate and as secondary particles released from the substrate, other types of energy can be used, such as small beams of incident light, and other charged particles such as protons and helium ions) t...

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Abstract

A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.

Description

technical field [0001] The invention relates to charged particle detection and inspection systems, and in particular the invention relates to such systems using multiple beamlets of charged particles. Background technique [0002] A conventional multi-beamlet inspection system is known from WO 2005 / 024881. The multi-beamlet inspection system disclosed therein is used for inspecting objects, such as semiconductor wafers. Multiple primary electron beamlets are focused parallel to each other to form an array of primary electron beam spots on the object. The secondary electrons generated by the primary electrons and emitted from the respective primary electron beam spots are received by the charged particle imaging optical system to form a corresponding array of secondary electron beamlets, which are provided to the electron beamlets with the array of detection elements A detection system such that each secondary electron beamlet is incident on a separate detection element. T...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/244H01J37/09
CPCH01J37/244H01J37/09H01J2237/24592H01J2237/2446H01J2237/2817H01J2237/0437H01J2237/0453
Inventor R.尼佩尔迈耶
Owner CARL ZEISS MICROSCOPY GMBH
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