Transmission type Mueller matrix spectrum ellipsometer and measuring method thereof

A technology of full Mueller matrix and spectroscopic ellipsometer, applied in polarization spectrum, spectrum investigation, etc., can solve problems affecting measurement accuracy and achieve fast and accurate measurement

Active Publication Date: 2013-06-05
WUHAN EOPTICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the reflective optical system can well solve the dispersion problem in the full spectrum range, the metal coating of the mirror, the core component of the ref

Method used

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  • Transmission type Mueller matrix spectrum ellipsometer and measuring method thereof
  • Transmission type Mueller matrix spectrum ellipsometer and measuring method thereof
  • Transmission type Mueller matrix spectrum ellipsometer and measuring method thereof

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Embodiment Construction

[0023] The specific embodiments of the present invention will be further described below in conjunction with the accompanying drawings. It should be noted here that the descriptions of these embodiments are used to help understand the present invention, but are not intended to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0024] Such as figure 1 As shown, the transmission full Mueller matrix spectroscopic ellipsometer provided in this example includes a polarizer arm and an analyzer arm. Wherein, the polarizing arm includes a light source 1, a first lens group 2, a polarizer 3, and a first rotary compensator 5 driven by a first servo motor 4; a sample stage 6 is used to hold a sample to be tested; It includes a second rotary compensator 7 driven by a second servo motor 8, an analyzer 9,...

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Abstract

The invention discloses a transmission type Mueller matrix spectrum ellipsometer and a measuring method thereof. The transmission type Mueller matrix spectrum ellipsometer measuring method comprises the following steps: projecting modulation rays produced by a partial arm on the surface of a to-be-tested sample, a check partial arm demodulates and receives the rays reflected (or transmitted) by the to-be-tested sample, by proceeding harmonic wave analysis to a tested spectrum, computing and acquiring the full Mueller matrix information of the to-be-tested sample, further through arithmetic of nonlinear regression, liberty matching, and the like, and fitting and extracting information of an optical constant, characteristic, morphology, size and the like of the to-be-tested sample. An ellipsometer comprises the partial arm (comprises light source, a lens group, a polarizer, and a compensator driven by a servo motor),the to-be-tested sample and the check partial arm (comprises the compensator driven by a servo motor, an analyzer the lens group and a spectrograph. The transmission type Mueller matrix spectrum ellipsometer and the measuring method thereof can achieve all kinds of materials and components with information phoelectron functions, and online measurement of all kinds of nano-structures in nano-fabrication, so that transmission type Mueller matrix spectrum ellipsometer and the measuring method thereof have the advantages of being capable of possessing non-destructive property, fast, and low in cost.

Description

technical field [0001] The invention belongs to the field of detection and measurement, and in particular relates to a transmission type full Muller matrix spectroscopic ellipsometer and a measurement method thereof. The ellipsometer can be used for the analysis of optical constants of various information optoelectronic functional materials and devices. The measurement objects include metals, semiconductors, superconductors, insulators, amorphous materials, magnetic materials, thin film materials, electro-optic materials, nonlinear materials, isotropic and / or Or anisotropic materials, etc.; can be used for the surface, interface and roughness analysis of thin film materials; can also be used for the shape parameters of various nanostructures in nanomanufacturing, such as characteristic line width, period spacing, height, side wall angle, overlay Measurement of error, line edge roughness and line width roughness, etc. Background technique [0002] Ellipsometer (referred to a...

Claims

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Application Information

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IPC IPC(8): G01J3/447
Inventor 刘世元李伟奇张传维陈修国
Owner WUHAN EOPTICS TECH CO LTD
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