Transmission type Mueller matrix spectrum ellipsometer and measuring method thereof

Abstract

The invention discloses a transmission type Mueller matrix spectrum ellipsometer and a measuring method thereof. The transmission type Mueller matrix spectrum ellipsometer measuring method comprises the following steps: projecting modulation rays produced by a partial arm on the surface of a to-be-tested sample, a check partial arm demodulates and receives the rays reflected (or transmitted) by the to-be-tested sample, by proceeding harmonic wave analysis to a tested spectrum, computing and acquiring the full Mueller matrix information of the to-be-tested sample, further through arithmetic of nonlinear regression, liberty matching, and the like, and fitting and extracting information of an optical constant, characteristic, morphology, size and the like of the to-be-tested sample. An ellipsometer comprises the partial arm (comprises light source, a lens group, a polarizer, and a compensator driven by a servo motor),the to-be-tested sample and the check partial arm (comprises the compensator driven by a servo motor, an analyzer the lens group and a spectrograph. The transmission type Mueller matrix spectrum ellipsometer and the measuring method thereof can achieve all kinds of materials and components with information phoelectron functions, and online measurement of all kinds of nano-structures in nano-fabrication, so that transmission type Mueller matrix spectrum ellipsometer and the measuring method thereof have the advantages of being capable of possessing non-destructive property, fast, and low in cost.

Description

technical field [0001] The invention belongs to the field of detection and measurement, and in particular relates to a transmission type full Muller matrix spectroscopic ellipsometer and a measurement method thereof. The ellipsometer can be used for the analysis of optical constants of various information optoelectronic functional materials and devices. The measurement objects include metals, semiconductors, superconductors, insulators, amorphous materials, magnetic materials, thin film materials, electro-optic materials, nonlinear materials, isotropic and / or Or anisotropic materials, etc.; can be used for the surface, interface and roughness analysis of thin film materials; can also be used for the shape parameters of various nanostructures in nanomanufacturing, such as characteristic line width, period spacing, height, side wall angle, overlay Measurement of error, line edge roughness and line width roughness, etc. Background technique [0002] Ellipsometer (referred to a...

AI Technical Summary

Problems solved by technology

Although the reflective optical system can well solve the dispersion problem in the full spectrum range, the metal coating of the mirror, the core component of the reflective optical system, will change the polarization state of the beam, which is equivalent to adding Other unknown samples will affect the final measurement accuracy

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