Silicon-containing materials with controllable microstructure
A technology of silane and silicon coating, which is applied in the direction of liquid-coating devices, coatings, and pre-treated surfaces.
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[0040] Provided methods of making silicon-containing materials include reacting an amine-reactive compound having at least one free radically polymerizable group per molecule with an amine-functional silane. Amine reactive compounds can be small molecules, monomers, oligomers, polymers or mixtures thereof. The amine-reactive compound may be an organic compound or an organopolysiloxane compound. In addition to comprising at least one free radically polymerizable group per molecule, provided amine-reactive compounds may also comprise additional functional groups, such as one or more hydrolyzable groups.
[0041] In some embodiments, the amine-reactive compound may be selected from mineral acids, Lewis acids, carboxylic acids, carboxylic acid derivatives such as anhydrides and succinates, metal carboxylate salts, isocyanates, aldehydes, epoxides, acyl Chlorine and sulfuryl chloride. Examples of amine-reactive compounds having at least one radically polymerizable group include, ...
example
[0088] The present invention will be better understood by reference to the following examples, which are provided by way of illustration and which those skilled in the art will recognize are not intended to be limiting.
example 1
[0090] In a glass vial, 4.01 g of a 50% 3-aminopropyltriethoxysilane (Dow Corning) / PGMEA (propylene glycol methyl ether acetate; Aldrich) solution was mixed with 1.56 g of 50% methacrylic acid (Aldrich) / PGMEA solution mixed. In a glass vial, 4.01 g of this mixture was mixed with 0.16 g of the organoborane initiator TnBB-MOPA (tri-n-butylborane complexed with 1.3 molar equivalents of 3-methoxypropylamine) to form a free radical polymerization precursor material. The resulting precursor material was filtered through a 0.2 μm filter and then spin-coated onto a silicon wafer at 3300 rpm to form a continuous coating or film, except for a few pinhole defects.
[0091] When examined in tapping mode using atomic force microscopy (AFM), the sample surface unexpectedly exhibits a vertical alignment of fairly uniform cylindrical protrusions on a molecularly smooth background (RMS roughness 0.7 nm) The arrays have a height of about 5-8 nm and a diameter of about 0.8-2.3 μm, as shown in...
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