High-accuracy repeated positioning structure capable of achieving rapid changing and used in photoetching projection lens
A technology of repeated positioning accuracy and lithography projection, applied in microlithography exposure equipment, optics, optical components, etc., can solve the maintenance process of precision focusing, positioning and installation, time-consuming, low production efficiency, bottom lens volatile pollution, etc. problems, to avoid the precise focusing and positioning installation process, save maintenance time, and improve the overall work efficiency.
Inactive Publication Date: 2015-04-22
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology
[0003] In order to solve the technical problem that the bottom lens of the existing projection lithography objective lens is easily polluted by volatile substances when the objective lens is in operation, and the maintenance process such as precise focusing, positioning and installation when replacing the objective lens lens is very time-consuming, resulting in low production efficiency. The technical problem, the present invention provides a Rapidly replaceable high-repeatability structure for lithography projection objectives
Method used
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[0022] The present invention will be described in further detail below in conjunction with the accompanying drawings.
[0023] Such as figure 1 and figure 2 As shown, the present invention is used in the lithography projection objective lens and can quickly replace the high repeatable positioning accuracy structure comprising: three magnetic steel sheets 1, three positioning ball heads 2, lower protective window frame 3, positioning groove slide rails, three Fasten the screw 4 and connect the mirror frame 7.
[0024] Such as image 3 and Figure 4 As shown, the lower protective window frame 3 includes a lower protective window frame flange 3-1 and an annular side wall 3-2 with an inner bevel positioned on the lower protective window frame flange 3-1, and the annular side wall 3- 2 and the lower protective window frame flange 3-1 are integrally formed, and together with the lower protective window lens 6 installed in the center of the lower protective window frame flange 3...
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The invention discloses a high-accuracy repeated positioning structure capable of achieving rapid changing and used in a photoetching projection lens, and belongs to the field of installation and positioning structures of protection windows under photoetching projection lenses. The structure comprises a protection window lens frame, positioning ball heads, a positioning slot slide rail, magnetic steel pieces and the like; the magnetic steel pieces are mounted inside the lens frame so as to overcome the dead weight of the protection window lens frame and provide an adsorption force; and a protection window lens is bonded in the lens frame, so that the lens frame and a lens can be changed at the same time. During disassembly, in order to reduce the absorption of magnetic steel to the positioning ball heads, a positioning slot is designed into an annular inclined plane, and the disassembly is facilitated. A conical groove on the positioning slot slide rail is used for achieving high-accuracy repeated positioning, and the installation is facilitated. The high-accuracy repeated positioning structure has the advantages the structure is simple, the installation and the disassembly are facilitated, screws are not required to be installed, the adsorption force is adjustable, and the like; and screws are not required for fastening the lens frame, so that potential threats to a lens table when the screws fall accidentally in installation and disassembly processes are avoided.
Description
technical field [0001] The invention belongs to the field of installation and positioning structure of a protection window under a lithography projection objective lens, and in particular relates to a fast-replaceable high-repeat positioning precision structure used in a lithography projection objective lens. Background technique [0002] Projection lithography technology is the forerunner and foundation of large-scale integrated circuit manufacturing technology and micro-optics and micro-mechanical technology, which determines the integration level of integrated circuits. Projection lithography equipment is the key equipment in the large-scale integrated circuit manufacturing process. With the continuous increase of market demand, the overall performance of lithography equipment has been improved year by year, and its productivity has long been an important indicator for the evaluation of lithography equipment. Since the distance between the bottom of the objective lens and...
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IPC IPC(8): G02B7/02G03F7/20
Inventor 孙振郭抗巩岩华洋洋倪明阳李显凌
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI