Heat exchange system and method for high-temperature semiconductor process equipment

Abstract

The invention provides a heat exchange system and a heat exchange method for a machine with high-temperature semiconductor process. The heat exchange system is connected with two ventilation ports of a reaction chamber of the machine and comprises an air inlet, an air outlet, a heat exchanger, a blower at the air outlet and a heat sensor. Hot air discharged from the reaction chamber enters the air inlet, sequentially passes through the heat exchanger, the heat sensor and the air outlet, and is driven into the reaction chamber by the blower at the air outlet. The heat exchanger is used for cooling the hot air. The heat sensor is used for acquiring the temperature of the air cooled by the heat exchanger. When the acquired temperature of the cooled air is higher than a preset value, heat exchange is stopped. By the heat sensor, errors and inefficiency, which influence semiconductor process, of heat exchange are avoided.

Description

technical field [0001] The invention relates to the field of semiconductor technology, in particular to a heat exchange system and method for a high-temperature semiconductor technology machine. Background technique [0002] In the existing technology, in the high-temperature semiconductor processing process, it is necessary to perform heat exchange treatment on the circulating air to achieve cooling of the hot air. However, when using a heat exchanger for heat exchange treatment, once the heat exchanger itself appears Inefficiency and errors will make the air temperature obtained by the heat exchange process unstable or fail to meet the semiconductor process requirements, which in turn will make the wafer doped with impurities. This inefficiency may be due to blockage of water flow in the exchanger, or it may be an inefficient degradation of the function of the exchanger itself. Contents of the invention [0003] The technical problem to be solved by the invention is how...

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Problems solved by technology

[0002] In the existing technology, in the high-temperature semiconductor processing process, it is necessary to perform heat exchange treatment on the circulating air to achieve cooling of the hot air. However, when using a heat exchanger for heat exchange treatment, once the heat exchanger itself appears Inefficiency and errors will make the air temperature obtained by heat exchange treatment unstable or fail to meet the semiconductor process requirements, which will make the wafer doped with impurities

This inefficiency may be due to blockage of water flow in the exchanger, or it may be due to inefficient degradation of the function of the exchanger itself

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