A liquid metal target generating device for laser light source

Abstract

The invention discloses a liquid metal target generating device for a laser source, which is used for generating metal liquid drops for exciting plasma and comprises a liquid storage box, a cavity body and a rotary wheel; the liquid storage box, of which the bottom end is communicated with a conduit, is used for storing a liquid metal target material; the cavity body is positioned below the liquid storage box to enable the conduit to penetrate the upper part of the cavity body to enter into the cavity body, thus enabling the liquid metal target material in the liquid storage box to drip into the cavity body through the conduit; the rotary wheel is cylindrical, can rotate around the central axis of the rotary wheel, and is vertical to and aligned with the conduit to enable the liquid metal target material dripping from the conduit to fall onto the side face of the rotary wheel, thus forming the metal liquid drops by the accelerated rotation of the rotary wheel. The liquid metal target generating device for the laser source can generate a stable, high-frequency and high-speed microsized liquid metal target, and can effectively control the diameter of the liquid metal target, thus ensuring the lighting stability and effectively controlling the system pollution in the lighting process.

Description

technical field [0001] The invention relates to a liquid metal target generating device, in particular to a liquid metal target generating device for a laser light source. Background technique [0002] With the rapid development of the semiconductor industry, the lithography technology has changed from equal magnification lithography to miniature projection lithography, and the wavelength used is gradually shortened, from g-line (436nm), i-line (365nm), KrF (248nm), ArF ( 193nm) to extreme ultraviolet 13.5nm. With the reduction of the wavelength of the exposure light source, the difficulty of developing the light source is becoming more and more difficult, especially the extreme ultraviolet light source. [0003] LPP (Laser Produced Plasmas) is an important method of extreme ultraviolet light source generated by plasma excitation for photolithography. LPP uses a high-energy pulsed laser to irradiate a high-density metal target to generate high-temperature plasma, which emi...

AI Technical Summary

Problems solved by technology

If a pulsed laser is used, it is quite difficult to keep the synchronization of the laser light emission frequency and the droplet generation frequency, resulting in the failure of some liquid metal targets to be excited, which affects the light emission frequency stability of the laser light source

[0013] 2) The diameters of the metal droplets 5, 8, and 9 depend entirely on the caliber of the conduit 14, and the consistency is difficult to precisely control

Images