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an impedance matching element

A technology of impedance matching and components, applied in the field of metamaterials, can solve the problem of the reduction of the effect of metamaterials in response to electromagnetic waves

Active Publication Date: 2017-02-01
KUANG CHI INST OF ADVANCED TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, what the metamaterial changes is the electromagnetic response of the electromagnetic wave entering its interior. The electromagnetic wave incident on the surface of the metamaterial will still be reflected due to the sudden change in the refractive index, which will reduce the effect of the final metamaterial in responding to electromagnetic waves.

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Embodiment Construction

[0025] Such as figure 1 as shown, figure 1 It is a schematic diagram of the three-dimensional structure of the basic unit constituting the metamaterial. A basic unit of a metamaterial includes an artificial microstructure 2 and a substrate 1 to which the artificial microstructure is attached. In the present invention, the artificial microstructure is an artificial metal microstructure, and the artificial metal microstructure has a planar or three-dimensional topological structure that can respond to the electric field and / or magnetic field of the incident electromagnetic wave, and changes the performance of the artificial metal microstructure on each metamaterial basic unit. The pattern and / or size can change the response of each metamaterial elementary unit to incident electromagnetic waves. In the present invention, the artificial microstructure 2 is also covered with a covering layer 3, and the covering layer 3, the artificial microstructure 2 and the substrate 1 constitu...

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Abstract

The invention discloses an impedance matching element. The impedance matching element is applied to a metamaterial functional layer. The impedance matching element comprises first to Mth matching metamaterial laminates, wherein each matching metamaterial laminate comprises a base material and artificial microstructures which are cyclically ranked on the base material. On an ith matching metamaterial laminate in the first to Mth matching metamaterial laminates, the central point of the ith matching metamaterial laminate is used as a circle center, the radius is the refractive index at the position of r, wherein nmin is same minimum refractive index values possessed by the first to Mth matching metamaterial laminates, and the nmain (r) is refractive index distribution of the metamaterial functional layer. The metamaterial principle is utilized to arrange multi-layer matching metamaterial laminates, so that the refractive index of metamaterials in the incident direction of electromagnetic waves gradually changes, sudden change of the refractive index is reduced, and gain loss due to the fact that the electromagnetic waves are reflected are reduced.

Description

technical field [0001] The invention relates to the field of metamaterials, in particular to an impedance matching element for reducing the reflection of metamaterials on electromagnetic waves. Background technique [0002] Light, as a kind of electromagnetic wave, when it passes through glass, because the wavelength of light is much larger than the size of atoms, we can use the overall parameters of the glass, such as the refractive index, rather than the detailed parameters of the atoms that make up the glass to describe The response of glass to light. Correspondingly, when studying the response of materials to other electromagnetic waves, the response of any structure in the material whose scale is much smaller than the wavelength of the electromagnetic wave to electromagnetic waves can also be described by the overall parameters of the material, such as the dielectric constant ε and magnetic permeability μ. By designing the structure of each point of the material, the d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01Q15/00H01Q15/02
Inventor 刘若鹏季春霖岳玉涛尹小明李双双
Owner KUANG CHI INST OF ADVANCED TECH
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