Infrared-reflecting substrate

An infrared and substrate technology, applied in the direction of reflection/signal coatings, coatings, instruments, etc., can solve the problem of low transparency and achieve the effects of high transparency, excellent infrared reflection performance, and simple manufacturing

Inactive Publication Date: 2013-09-25
NAGASE CHEMTEX CORPORATION
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In Example 6 and Example 7, a layer of about 1 μm is formed, and it is estimated that the transparency is extremely low

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Infrared-reflecting substrate
  • Infrared-reflecting substrate
  • Infrared-reflecting substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1)

[0093] (Example 1) Example of using plate glass:

[0094] 50.0 g of an aqueous dispersion of a composite of poly(3,4-ethylenedioxythiophene) and polystyrenesulfonic acid (manufactured by Heraeus Co., Ltd.: CleviosP, conductivity 0.09 S / cm, solid content 1.3%), 0.5 g of surfactant (solids 10%), 0.05 g of leveling agent (solids 100%), 2 g of water, and 8 g of ethanol were mixed and stirred for 30 minutes. The resulting mixture was filtered through a 400-mesh SUS-made sieve to prepare a coating agent.

[0095] The obtained coating agent was coated on a blue plate glass (manufactured by advanced materials technology Co., Ltd.: AMT-8292) with a thickness of 0.7 mm by the bar coating method using a wire bar No. 8 (wet film thickness 18 μm), and Dry at 100° C. for 1 minute to obtain a base.

Embodiment 2)

[0096] (Example 2) Example of using plate glass:

[0097] Instead of CleviosP in Example 1, Clevios P ​​HC V4 (manufactured by Heraeus Co., Ltd.: conductivity 0.23 S / cm, solid content 1.2%), the matrix was obtained by the same method as in Example 1.

Embodiment 3)

[0098] (Example 3) Example of using plate glass:

[0099] Instead of CleviosP in Example 1, Clevios PH1000 (manufactured by Heraeus Co., Ltd.: conductivity 0.46 S / cm, solid content 1.1%), the matrix was obtained by the same method as in Example 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
electrical conductivityaaaaaaaaaa
reflectanceaaaaaaaaaa
Login to view more

Abstract

Provided is an infrared-reflecting substrate that can be readily produced by coating the surface of a base material, and that exhibits superior infrared-reflecting performance while also exhibiting high light-transmitting performance at a low film thickness. This infrared-reflecting substrate includes an infrared-reflecting layer formed by coating a transparent base material with a coating agent containing a complex of poly(3,4-disubstituted thiophene) and a polyanion, and exhibits a total light transmittance of 60% or greater. Preferably, the complex exhibits an electroconductivity of 0.15 (S / cm) or greater. Preferably, the infrared-reflecting layer has a film thickness of 0.50 [mu]m or less.

Description

technical field [0001] The present invention relates to a coating agent for forming a transparent film exhibiting infrared reflection performance, an infrared reflection film formed using the coating agent, and an infrared reflection substrate including the film. Background technique [0002] Infrared rays refer to electromagnetic waves with longer wavelengths than red light and shorter wavelengths than millimeter-wavelength radio waves, and their wavelengths are roughly distributed in the range of 0.7 μm to 1 mm. According to the length of the wavelength, it is divided into near-infrared, mid-infrared, and far-infrared. It is widely known that mid-infrared rays, far-infrared rays, etc. having long wavelengths are absorbed by an object, and that the temperature of the object rises due to this. [0003] Conventionally, research has been conducted on suppressing the temperature rise of the object by providing a thin film reflecting infrared rays on the surface of the object b...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C09D201/02B32B27/00C09D5/33C09D7/12C09D181/00C08J7/043C08J7/044
CPCC09D5/004C09D165/00C08J2367/02C08J2465/00G02B5/0808G02B5/208C08G2261/1424C08G2261/3223C08G2261/51C08G2261/794C08G2261/90G02B5/26C03C17/32C08J7/0427C08J7/043C08J7/044C08L25/18C08K5/13C08L67/00B32B27/00C09D181/00C09D201/02G02B1/04G02B1/10
Inventor 宫西恭子藤田贵史细见哲也
Owner NAGASE CHEMTEX CORPORATION
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products