Secondary anvil and secondary pressurizing unit of octahedral pressure cavity static high-pressure device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- FUNIK ULTRAHARD MATERIAL
- Publication Date
- 2013-12-18
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Abstract
Description
technical field
[0001] The invention belongs to a pressure device used in a superhigh pressure environment, in particular to a secondary anvil and a secondary booster unit in an octahedral pressure cavity static high pressure device used in material synthesis. technical background
[0002] The unique two-stage pressurization unit of the static high-pressure device in the octahedral pressure chamber enables this static high-pressure device to generate a cavity high-pressure environment with a maximum pressure of about 90 GPa when using a secondary anvil made of polycrystalline diamond sintered body [S.Zhai, E.Ito, Geosci.Front.2101(2011)], even a secondary anvil made of tungsten carbide cemented carbide can generate a cavity high pressure environment with a maximum pressure of about 30GPa. Therefore, the use of an octahedral pressure chamber static high pressure device can directly convert graphite into diamond under higher pressure and temperature conditions, and synthesize ...