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Spectral ellipsometry device and method

A spectral ellipsometry and measurement device technology, applied in the field of optical measurement, can solve the problems of increasing the volume, weight and cost of the device, increasing the complexity of device integration, etc., and achieve the effect of compact structure and easy integration

Active Publication Date: 2016-04-13
RAINBOW SOURCE LASER RSLASER
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This will not only increase the volume, weight and cost of the device, but also increase the integration complexity of the device

Method used

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  • Spectral ellipsometry device and method
  • Spectral ellipsometry device and method
  • Spectral ellipsometry device and method

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Embodiment 1

[0025] In order to enable those skilled in the art to understand the present invention in more detail, the present invention will be described in detail below in conjunction with the accompanying drawings.

[0026] like figure 1 said, figure 1 It is a spectroscopic ellipsometry device in an embodiment of the present invention, wherein the spectroscopic ellipsometry device is used to realize the measurement of the thickness variation of the film layer 5, wherein the film layer 5 has a The first thickness variation has a second thickness variation at the second position 51 . Specifically, the spectral ellipsometry device includes: a light source 1, a spectral extinction detector 2, an optical multiplexer 3, a spectral polarization extinction device 4, and a film layer 5; wherein,

[0027] A light source 1, the light source 1 is used to provide a measuring beam for measuring the thickness variation of the film layer 5 .

[0028] Specifically, the light source 1 is a wide-spect...

Embodiment 2

[0056] Further, in order to be applicable to occasions sensitive to electromagnetic radiation, heat transfer and vacuum outgassing, the embodiment of the present invention also provides a typical application embodiment.

[0057] like figure 2 As shown, the embodiment of the present invention also provides an airtight chamber 7, which includes the spectral polarization extinction device 4 and the film layer 5, wherein the airtight chamber 7 also includes: an optical feed Port 6, the optical feedthrough port 6 is connected to the spectral polarization extinguisher 4, and is used to sequentially output the first polarized extinction beam and the second polarized extinction beam to the optical multiplexer 3.

[0058] Further, the film layer 5 is in the airtight chamber 7, wherein the film layer 5 can be a film layer on multiple groups of coating samples, and the air pressure in the airtight chamber 7 can be higher than or equal to or Below standard atmospheric pressure.

[005...

Embodiment 3

[0061] In order to more clearly illustrate a spectroscopic ellipsometry device provided by the present invention, an embodiment of the present invention also provides a spectroscopic ellipsometry method, such as image 3 As shown, the method includes:

[0062] Step 10: In the first time period, control the optical multiplexer so that the light source and the spectral extinction detector are respectively connected to the output port of the first spectral polarization extinction module and the input port of the first spectral polarization extinction module to measure The first thickness variation of the first position of the film layer;

[0063] Step 20: In the second time period, control the optical multiplexer so that the light source and the spectral extinction detector are respectively connected to the output port of the second spectral polarization extinction module and the input port of the second spectral polarization extinction module to measure A second thickness varia...

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PUM

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Abstract

The invention discloses a spectrum elliptic polarization measuring device and method and belongs to the technical field of optical measurement. The device comprises a light source, a spectrum polarization attenuator, a spectral extinction detector and an optical multiplexer, wherein the light source is used for providing a measurement light beam for measurement of the thickness variable quantity of a film layer, the spectrum polarization attenuator is used for receiving the measurement light beam and outputting a first polarization extinction light beam with the first thickness variable quantity and a second polarization extinction light beam with the second thickness variable quantity, the spectral extinction detector is used for receiving the first polarization extinction light beam and the second polarization extinction light beam and measuring the first thickness variable quantity and the second thickness variable quantity of the film layer according to the first polarization extinction light beam and the second polarization extinction light beam respectively, and the optical multiplexer is used for providing optical multiplexing between the light source and the spectrum polarization attenuator, and optical multiplexing between the spectrum polarization attenuator and the spectral extinction detector. According to the spectrum elliptic polarization measuring device and method with the optical multiplexing technology, the thickness variable quantities of film layers at different positions are measured with high measuring efficiency and high automation level.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to a spectral ellipsometry device and method. Background technique [0002] With the continuous development of the field of optical measurement, spectral ellipsometry has become an optical measurement technology for precise determination of physical constants of thin film samples. [0003] Spectral ellipsometry is to accurately measure the physical constants of the film sample to be tested by measuring the polarization state of the reflected (or transmitted) light of the film sample to be tested and its change. Most of the current spectroscopic ellipsometry devices consist of two arms, one of which is equipped with a light source and a polarization generating device to provide a polarization measurement beam that meets the requirements; the other arm is equipped with a polarization detection device and a spectral detector for detecting The spectral polarization state of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/06
Inventor 宗明成黄有为徐天伟马向红
Owner RAINBOW SOURCE LASER RSLASER