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Planar array substrate, sensor and manufacturing method of planar array substrate

An array substrate and flat panel technology, which is applied in the manufacture of sensors and flat array substrates, and in the field of flat array substrates, can solve the problems of complex manufacturing process and high cost

Active Publication Date: 2014-02-12
BEIJING BOE OPTOELECTRONCIS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0015] Therefore, the current amorphous silicon TFT flat panel X-ray sensor usually needs 10 masking processes to complete, the manufacturing process is very complicated and the cost is high

Method used

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  • Planar array substrate, sensor and manufacturing method of planar array substrate
  • Planar array substrate, sensor and manufacturing method of planar array substrate
  • Planar array substrate, sensor and manufacturing method of planar array substrate

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Embodiment Construction

[0107] The basic idea of ​​the present invention is: form the gate and the gate scanning line on the substrate; form the gate insulating layer, the active layer and the first transparent conductive layer on the substrate on which the gate and the gate scanning line are formed; On the substrate of the insulating layer, the active layer and the first transparent conductive layer, the drain electrode, the data line, the source electrode, and the common electrode layer are formed; on the substrate forming the drain electrode, the data line, the source electrode, and the common electrode layer, the second A passivation layer, a second passivation layer and via holes; a second transparent conductive layer is formed on the substrate forming the first passivation layer, the second passivation layer and the via holes; a second transparent conductive layer is formed on the substrate forming the second transparent conductive layer On the substrate, a first resin layer and a second resin l...

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Abstract

The invention discloses a manufacturing method of a planar array substrate. The manufacturing method of the planar array substrate comprises the steps that a grid electrode and a grid electrode scanning line are formed on the substrate, a grid insulating layer, an active layer and a first transparent conducting layer are formed on the substrate where the grid electrode and the grid electrode scanning line are formed, a drain electrode, a data line, a source electrode and a public electrode layer are formed on the substrate where the grid insulating layer, the active layer and the first transparent conducting layer are formed, a first passivation layer, a second passivation layer and a via hole are formed on the substrate where the drain electrode, the data line, the source electrode and the public electrode layer are formed, a second transparent conducting layer is formed on the substrate where the first passivation layer, the second passivation layer and the via hole are formed, a first resin layer and a second resin layer are formed on the substrate where the second transparent conducting layer is formed, and a third transparent conducting layer is formed on the substrate where the first resin layer and the second resin layer are formed. The invention further provides the planar array substrate and a senor. According to the planar array substrate, the sensor and the manufacturing method of the planar array substrate, the number of used masks can be reduced and the capacity of equipment is improved.

Description

technical field [0001] The invention relates to thin film field effect transistor (TFT, Thin Film Transistor) manufacturing technology and sensor manufacturing technology, in particular to a flat array substrate, a sensor and a method for manufacturing the flat array substrate. Background technique [0002] On December 15, 2009, the Ministry of Industry and Information Technology, the Ministry of Science and Technology, the Ministry of Finance, and the State-owned Assets Supervision and Administration Commission promulgated the "Guidance Catalog for Independent Innovation of Major Technical Equipment", and project 12.3.5 established "amorphous silicon TFT flat-panel X-ray sensor" as a project For "Newly Developed Products". The four ministries and commissions believe that in the medical market, the capacity of amorphous silicon TFT flat-panel X-ray sensors in township hospitals (about 60,000) is about 18 billion. The replenishment amount is 1.8 billion, so the TFT flat pane...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/02H01L21/77
CPCH01L27/1288
Inventor 徐少颖谢振宇陈旭
Owner BEIJING BOE OPTOELECTRONCIS TECH CO LTD