A method for detecting splicing exposure errors of color filter substrates and a mask plate

Abstract

The invention discloses in an embodiment a method and masks for detecting a splicing exposure error of a color film substrate, and relates to the field of display technology. The method and the masks can accurately detect the interlayer position deviation value of structural units in the color film substrate. The method includes: a step of forming a first structural unit and a first position marker in the color film substrate by using a first mask comprising at least a first structural unit figure and a first position maker figure, wherein the first position maker is positioned in a display zone in the color film substrate and used for representing the position of the first structural unit; a step of forming a second structural unit and a first coverage area in the color film substrate by using a second mask comprising at least a second structural unit figure and a first coverage figure, wherein the first coverage area figure is positioned in the display zone in the color film substrate and is used for representing the position of the second structural unit; and a step of determining the position deviation value between the first structural unit and the second structural unit according to the position deviation value between the first position maker and the first coverage area.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for detecting splicing exposure errors of color filter substrates and a mask plate. Background technique [0002] With the continuous development and improvement of display technology, major panel manufacturers have invested in new generation production lines in order to produce display panels with larger sizes and clearer picture quality. The color filter substrate is an important part of the display panel, and its process precision plays a decisive role in the picture quality displayed by the display panel. [0003] Such as figure 1 As shown, generally speaking, the prior art color filter substrate includes the following structure: a substrate 1 , a backplane ITO film 2 , a black matrix 3 , a color filter film layer 4 , a protective film layer 5 and a columnar spacer 6 . In the process of preparing the color filter substrate including the above-mentioned structure, ...

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Problems solved by technology

[0005] In the process of realizing the preparation of the above-mentioned larger-sized color filter substrate, the inventors found that there are at least the following problems in the prior art: due to the large size of the color filter substrate (especially the size of the display area of ​​the color filter substrate is larger than the size of the mask plate) , resulting in the inability to determine the positional relationship between the structural units in the color filter substrate by using the position marks set outside the display area of ​​the color filter substrate

Therefore, when the positions of the structural units in the color filter substrate deviate from each other, technicians cannot determine the amount of deviation and correct the deviation.

This will lead to a series of problems on the color filter substrate, for example: when there is a deviation between the color filter film and the black matrix, the line width of the color filter film is usually widened to compensate for the deviation

However, this will increase the overlapping area between the black matrix and the color filter film, resulting in an increase in the difference in the twist angle, which is detrimental to the display quality; or, when there is a deviation in the position of the columnar spacer, the deviation may cause the display panel There is a problem with the box, causing defects and reducing the yield

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